Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417902 | Method for cleaning a chamber | Ran Lin, Tamal Mukherjee, Jengyi Yu, Samantha Tan, Yang Pan +1 more | 2025-09-16 |
| 12400842 | Method of cleaning chamber components with metal etch residues | Samantha Tan, Ran Lin, Tamal Mukherjee, Chunhong Zhou, Xiaoyu Kang +2 more | 2025-08-26 |
| 12266542 | Atomic layer etching for subtractive metal etch | Mohand Brouri, Samantha Tan, Shih-Ked Lee, Yiwen FAN, Wook Choi +3 more | 2025-04-01 |
| 12256645 | Chemical etch nonvolatile materials for MRAM patterning | Tamal Mukherjee, Zhongwei Zhu, Samantha Tan, Ran Lin, Yang Pan +2 more | 2025-03-18 |
| 12105422 | Photoresist development with halide chemistries | Samantha Tan, Jengyi Yu, Da Li, Yiwen FAN, Yang Pan +5 more | 2024-10-01 |
| 12080562 | Atomic layer etch and ion beam etch patterning | Samantha Tan, Tamal Mukherjee, Girish Dixit, Yang Pan | 2024-09-03 |
| 11935758 | Atomic layer etching for subtractive metal etch | Mohand Brouri, Samantha Tan, Shih-Ked Lee, Yiwen FAN, Wook Choi +3 more | 2024-03-19 |
| 11450513 | Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials | Tamal Mukherjee, Mohand Brouri, Samantha Tan, Yang Pan, Keren Jacobs Kanarik | 2022-09-20 |
| 11069535 | Atomic layer etch of tungsten for enhanced tungsten deposition fill | Chiukin Steven Lai, Keren Jacobs Kanarik, Samantha Tan, Anand Chandrashekar, Teh-Tien Su +2 more | 2021-07-20 |
| 10763083 | High energy atomic layer etching | Samantha Tan, Tamal Mukherjee, Keren Jacobs Kanarik, Yang Pan | 2020-09-01 |
| 10749103 | Dry plasma etch method to pattern MRAM stack | Samantha Tan, Taeseung Kim, Jeffrey Marks, Thorsten Lill | 2020-08-18 |
| 10727073 | Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces | Samantha Tan, Keren Jacobs Kanarik, Thorsten Lill, Yang Pan | 2020-07-28 |
| 10515816 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2019-12-24 |
| 10374144 | Dry plasma etch method to pattern MRAM stack | Samantha Tan, Taeseung Kim, Jeffrey Marks, Thorsten Lill | 2019-08-06 |
| 10186426 | Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2019-01-22 |
| 10096487 | Atomic layer etching of tungsten and other metals | Samantha Tan, Keren Jacobs Kanarik, Jeffrey Marks, Taeseung Kim, Meihua Shen +1 more | 2018-10-09 |
| 10056264 | Atomic layer etching of GaN and other III-V materials | Tomihito Ohba, Samantha Tan, Keren Jacobs Kanarik, Jeffrey Marks, Kazuo Nojiri | 2018-08-21 |
| 9972504 | Atomic layer etching of tungsten for enhanced tungsten deposition fill | Chiukin Steven Lai, Keren Jacobs Kanarik, Samantha Tan, Anand Chandrashekar, Teh-Tien Su +2 more | 2018-05-15 |
| 9806252 | Dry plasma etch method to pattern MRAM stack | Samantha Tan, Taeseung Kim, Jeffrey Marks, Thorsten Lill | 2017-10-31 |
| 9805941 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2017-10-31 |
| 9576811 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2017-02-21 |
| 9502600 | Inorganic solution and solution process for electronic and electro-optic devices | Yang Yang, Shenghan Li, Wan-Ching Hsu | 2016-11-22 |
| 9391267 | Method to etch non-volatile metal materials | Meihua Shen, Harmeet Singh, Samantha Tan, Jeffrey Marks, Thorsten Lill +2 more | 2016-07-12 |
| 9257638 | Method to etch non-volatile metal materials | Samantha Tan, Meihua Shen, Richard Janek, Jeffrey Marks, Harmeet Singh +1 more | 2016-02-09 |
| 9130158 | Method to etch non-volatile metal materials | Meihua Shen, Harmeet Singh, Samantha Tan, Jeffrey Marks, Thorsten Lill +2 more | 2015-09-08 |