Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12119243 | Plasma etching chemistries of high aspect ratio features in dielectrics | Samantha Tan, Yang Pan, Jeffrey Marks | 2024-10-15 |
| 11721558 | Designer atomic layer etching | — | 2023-08-08 |
| 11594429 | Plasma etching chemistries of high aspect ratio features in dielectrics | Samantha Tan, Yang Pan, Jeffrey Marks | 2023-02-28 |
| 11450513 | Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials | Wenbing Yang, Tamal Mukherjee, Mohand Brouri, Samantha Tan, Yang Pan | 2022-09-20 |
| 11239094 | Designer atomic layer etching | — | 2022-02-01 |
| 11069535 | Atomic layer etch of tungsten for enhanced tungsten deposition fill | Chiukin Steven Lai, Samantha Tan, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang +2 more | 2021-07-20 |
| 10763083 | High energy atomic layer etching | Wenbing Yang, Samantha Tan, Tamal Mukherjee, Yang Pan | 2020-09-01 |
| 10727073 | Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces | Samantha Tan, Wenbing Yang, Thorsten Lill, Yang Pan | 2020-07-28 |
| 10566212 | Designer atomic layer etching | — | 2020-02-18 |
| 10566213 | Atomic layer etching of tantalum | Taeseung Kim | 2020-02-18 |
| 10515816 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2019-12-24 |
| 10304659 | Ale smoothness: in and outside semiconductor industry | Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan, Jeffrey Marks +1 more | 2019-05-28 |
| 10186426 | Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) | Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2019-01-22 |
| 10121639 | Mixed mode pulsing etching in plasma processing systems | — | 2018-11-06 |
| 10096487 | Atomic layer etching of tungsten and other metals | Wenbing Yang, Samantha Tan, Jeffrey Marks, Taeseung Kim, Meihua Shen +1 more | 2018-10-09 |
| 10056264 | Atomic layer etching of GaN and other III-V materials | Wenbing Yang, Tomihito Ohba, Samantha Tan, Jeffrey Marks, Kazuo Nojiri | 2018-08-21 |
| 9984858 | ALE smoothness: in and outside semiconductor industry | Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan, Jeffrey Marks +1 more | 2018-05-29 |
| 9972504 | Atomic layer etching of tungsten for enhanced tungsten deposition fill | Chiukin Steven Lai, Samantha Tan, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang +2 more | 2018-05-15 |
| 9837312 | Atomic layer etching for enhanced bottom-up feature fill | Samantha Tan, Taeseung Kim, Jengyi Yu, Praveen Nalla, Novy Tjokro +1 more | 2017-12-05 |
| 9805941 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2017-10-31 |
| 9583316 | Inert-dominant pulsing in plasma processing systems | — | 2017-02-28 |
| 9576811 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2017-02-21 |
| 9425025 | Mixed mode pulsing etching in plasma processing systems | — | 2016-08-23 |
| 9214320 | Inert-dominant pulsing in plasma processing systems | — | 2015-12-15 |
| 8883028 | Mixed mode pulsing etching in plasma processing systems | — | 2014-11-11 |