| 12119243 |
Plasma etching chemistries of high aspect ratio features in dielectrics |
Samantha Tan, Yang Pan, Jeffrey Marks |
2024-10-15 |
$173,043,000 |
| 11721558 |
Designer atomic layer etching |
— |
2023-08-08 |
$393,474,000 |
| 11594429 |
Plasma etching chemistries of high aspect ratio features in dielectrics |
Samantha Tan, Yang Pan, Jeffrey Marks |
2023-02-28 |
$186,503,000 |
| 11450513 |
Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials |
Wenbing Yang, Tamal Mukherjee, Mohand Brouri, Samantha Tan, Yang Pan |
2022-09-20 |
$144,829,000 |
| 11239094 |
Designer atomic layer etching |
— |
2022-02-01 |
$175,197,000 |
| 11069535 |
Atomic layer etch of tungsten for enhanced tungsten deposition fill |
Chiukin Steven Lai, Samantha Tan, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang +2 more |
2021-07-20 |
$260,622,000 |
| 10763083 |
High energy atomic layer etching |
Wenbing Yang, Samantha Tan, Tamal Mukherjee, Yang Pan |
2020-09-01 |
$45,225,000 |
| 10727073 |
Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces |
Samantha Tan, Wenbing Yang, Thorsten Lill, Yang Pan |
2020-07-28 |
$107,178,000 |
| 10566212 |
Designer atomic layer etching |
— |
2020-02-18 |
$39,150,000 |
| 10566213 |
Atomic layer etching of tantalum |
Taeseung Kim |
2020-02-18 |
$39,150,000 |
| 10515816 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) |
Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more |
2019-12-24 |
$46,593,000 |
| 10304659 |
Ale smoothness: in and outside semiconductor industry |
Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan, Jeffrey Marks +1 more |
2019-05-28 |
$16,840,000 |
| 10186426 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) |
Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more |
2019-01-22 |
$50,002,000 |
| 10121639 |
Mixed mode pulsing etching in plasma processing systems |
— |
2018-11-06 |
$29,398,000 |
| 10096487 |
Atomic layer etching of tungsten and other metals |
Wenbing Yang, Samantha Tan, Jeffrey Marks, Taeseung Kim, Meihua Shen +1 more |
2018-10-09 |
$18,504,000 |
| 10056264 |
Atomic layer etching of GaN and other III-V materials |
Wenbing Yang, Tomihito Ohba, Samantha Tan, Jeffrey Marks, Kazuo Nojiri |
2018-08-21 |
$41,269,000 |
| 9984858 |
ALE smoothness: in and outside semiconductor industry |
Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan, Jeffrey Marks +1 more |
2018-05-29 |
$79,057,000 |
| 9972504 |
Atomic layer etching of tungsten for enhanced tungsten deposition fill |
Chiukin Steven Lai, Samantha Tan, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang +2 more |
2018-05-15 |
$34,519,000 |
| 9837312 |
Atomic layer etching for enhanced bottom-up feature fill |
Samantha Tan, Taeseung Kim, Jengyi Yu, Praveen Nalla, Novy Tjokro +1 more |
2017-12-05 |
$38,425,000 |
| 9805941 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) |
Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more |
2017-10-31 |
$46,599,000 |
| 9583316 |
Inert-dominant pulsing in plasma processing systems |
— |
2017-02-28 |
$17,327,000 |
| 9576811 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) |
Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more |
2017-02-21 |
$45,528,000 |
| 9425025 |
Mixed mode pulsing etching in plasma processing systems |
— |
2016-08-23 |
$25,752,000 |
| 9214320 |
Inert-dominant pulsing in plasma processing systems |
— |
2015-12-15 |
$16,599,000 |
| 8883028 |
Mixed mode pulsing etching in plasma processing systems |
— |
2014-11-11 |
$13,880,000 |
