Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417902 | Method for cleaning a chamber | Ran Lin, Wenbing Yang, Tamal Mukherjee, Samantha Tan, Yang Pan +1 more | 2025-09-16 |
| 12417916 | Tin oxide films in semiconductor device manufacturing | Samantha Tan, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2025-09-16 |
| 12315727 | Eliminating yield impact of stochastics in lithography | Nader Shamma, Richard Wise, Samantha Tan | 2025-05-27 |
| 12293919 | Alternating etch and passivation process | Seongjun Heo, Chen-Wei Liang, Alan J. Jensen, Samantha Tan | 2025-05-06 |
| 12278125 | Integrated dry processes for patterning radiation photoresist patterning | Samantha Tan, Mohammed Haroon Alvi, Richard Wise, Yang Pan, Richard A. Gottscho +5 more | 2025-04-15 |
| 12191125 | Removing metal contamination from surfaces of a processing chamber | Samantha Tan, Seongjun Heo, Ge Yuan, Siva Kanakasabapathy | 2025-01-07 |
| 12183589 | Tin oxide mandrels in patterning | Samantha Tan, Seongjun Heo, Boris Volosskiy, Sivananda K. Kanakasabapathy, Richard Wise +2 more | 2024-12-31 |
| 12183604 | Integrated dry processes for patterning radiation photoresist patterning | Samantha Tan, Mohammed Haroon Alvi, Richard Wise, Yang Pan, Richard A. Gottscho +5 more | 2024-12-31 |
| 12105422 | Photoresist development with halide chemistries | Samantha Tan, Da Li, Yiwen FAN, Yang Pan, Jeffrey Marks +5 more | 2024-10-01 |
| 12094711 | Tin oxide films in semiconductor device manufacturing | Samantha Tan, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2024-09-17 |
| 12062538 | Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement | Samantha Tan, Liu-Yang Yang, Chen-Wei Liang, Boris Volosskiy, Richard Wise +4 more | 2024-08-13 |
| 12027375 | Selective etch using a sacrificial mask | Daniel Peter, Da Li, Alexander Kabansky, Katie Lynn Nardi, Samantha Tan +1 more | 2024-07-02 |
| 11988965 | Underlayer for photoresist adhesion and dose reduction | Samantha Tan, Jun Xue, Mary Anne Manumpil, Da Li | 2024-05-21 |
| 11848212 | Alternating etch and passivation process | Seongjun Heo, Chen-Wei Liang, Alan J. Jensen, Samantha Tan | 2023-12-19 |
| 11842888 | Removing metal contamination from surfaces of a processing chamber | Samantha Tan, Seongjun Heo, Ge Yuan, Siva Kanakasabapathy | 2023-12-12 |
| 11551938 | Alternating etch and passivation process | Seongjun Heo, Chen-Wei Liang, Alan J. Jensen, Samantha Tan | 2023-01-10 |
| 11355353 | Tin oxide mandrels in patterning | Samantha Tan, Seongjun Heo, Boris Volosskiy, Sivananda K. Kanakasabapathy, Richard Wise +2 more | 2022-06-07 |
| 11322351 | Tin oxide films in semiconductor device manufacturing | Samantha Tan, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2022-05-03 |
| 11314168 | Underlayer for photoresist adhesion and dose reduction | Samantha Tan, Jun Xue, Mary Anne Manumpil, Da Li | 2022-04-26 |
| 11257674 | Eliminating yield impact of stochastics in lithography | Nader Shamma, Richard Wise, Samantha Tan | 2022-02-22 |
| 10796912 | Eliminating yield impact of stochastics in lithography | Nader Shamma, Richard Wise, Samantha Tan | 2020-10-06 |
| 10685836 | Etching substrates using ALE and selective deposition | Samantha Tan, Richard Wise, Nader Shamma, Yang Pan | 2020-06-16 |
| 10546748 | Tin oxide films in semiconductor device manufacturing | Samantha Tan, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2020-01-28 |
| 10269566 | Etching substrates using ale and selective deposition | Samantha Tan, Richard Wise, Nader Shamma, Yang Pan | 2019-04-23 |
| 9837312 | Atomic layer etching for enhanced bottom-up feature fill | Samantha Tan, Taeseung Kim, Praveen Nalla, Novy Tjokro, Artur Kolics +1 more | 2017-12-05 |