| 12105422 |
Photoresist development with halide chemistries |
Samantha Tan, Jengyi Yu, Yiwen FAN, Yang Pan, Jeffrey Marks +5 more |
2024-10-01 |
| 12062538 |
Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement |
Jengyi Yu, Samantha Tan, Liu-Yang Yang, Chen-Wei Liang, Boris Volosskiy +4 more |
2024-08-13 |
| 12027375 |
Selective etch using a sacrificial mask |
Daniel Peter, Jengyi Yu, Alexander Kabansky, Katie Lynn Nardi, Samantha Tan +1 more |
2024-07-02 |
| 11988965 |
Underlayer for photoresist adhesion and dose reduction |
Samantha Tan, Jun Xue, Mary Anne Manumpil, Jengyi Yu |
2024-05-21 |
| 11314168 |
Underlayer for photoresist adhesion and dose reduction |
Samantha Tan, Jun Xue, Mary Anne Manumpil, Jengyi Yu |
2022-04-26 |
| 9559295 |
Nano multilayer film, field effect tube, sensor, random accessory memory and preparation method |
Xiu-Feng Han, Hou-Fang Liu, Syed Rizwan, Peng Guo, Guo Yu +2 more |
2017-01-31 |
