Issued Patents All Time
Showing 25 most recent of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12419499 | Endoscopic multifunctional accessory channel device | Steve Schomisch, Ryan Juza, Amitabh Chak | 2025-09-23 |
| 12376875 | Endoscopic tissue resection device | Amitabh Chak, Steve Schomisch, Ryan Juza | 2025-08-05 |
| 12119243 | Plasma etching chemistries of high aspect ratio features in dielectrics | Keren Jacobs Kanarik, Samantha Tan, Yang Pan | 2024-10-15 |
| 12105422 | Photoresist development with halide chemistries | Samantha Tan, Jengyi Yu, Da Li, Yiwen FAN, Yang Pan +5 more | 2024-10-01 |
| 11594429 | Plasma etching chemistries of high aspect ratio features in dielectrics | Keren Jacobs Kanarik, Samantha Tan, Yang Pan | 2023-02-28 |
| 11209729 | Vacuum-integrated hardmask processes and apparatus | George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more | 2021-12-28 |
| 10831096 | Vacuum-integrated hardmask processes and apparatus | George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more | 2020-11-10 |
| 10825680 | Directional deposition on patterned structures | Alexander Kabansky, Samantha Tan, Yang Pan | 2020-11-03 |
| 10749103 | Dry plasma etch method to pattern MRAM stack | Samantha Tan, Taeseung Kim, Wenbing Yang, Thorsten Lill | 2020-08-18 |
| 10606880 | Integrated architecture and network for arrangement and delivery of media | Nicholas J. Dauderman, Tadeusz Peter Matuchniak, SPYROS J. LAZARIS | 2020-03-31 |
| 10515816 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2019-12-24 |
| 10514598 | Vacuum-integrated hardmask processes and apparatus | George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more | 2019-12-24 |
| 10374144 | Dry plasma etch method to pattern MRAM stack | Samantha Tan, Taeseung Kim, Wenbing Yang, Thorsten Lill | 2019-08-06 |
| 10304659 | Ale smoothness: in and outside semiconductor industry | Keren Jacobs Kanarik, Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan +1 more | 2019-05-28 |
| 10186426 | Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) | Keren Jacobs Kanarik, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2019-01-22 |
| 10096487 | Atomic layer etching of tungsten and other metals | Wenbing Yang, Samantha Tan, Keren Jacobs Kanarik, Taeseung Kim, Meihua Shen +1 more | 2018-10-09 |
| 10056264 | Atomic layer etching of GaN and other III-V materials | Wenbing Yang, Tomihito Ohba, Samantha Tan, Keren Jacobs Kanarik, Kazuo Nojiri | 2018-08-21 |
| 9984858 | ALE smoothness: in and outside semiconductor industry | Keren Jacobs Kanarik, Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan +1 more | 2018-05-29 |
| 9934225 | Integrated architecture and network for arrangement and delivery of media | Nicholas J. Dauderman, Tadeusz Peter Matuchniak, SPYROS J. LAZARIS, Clifford Duvernois | 2018-04-03 |
| 9805941 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2017-10-31 |
| 9806252 | Dry plasma etch method to pattern MRAM stack | Samantha Tan, Taeseung Kim, Wenbing Yang, Thorsten Lill | 2017-10-31 |
| 9778561 | Vacuum-integrated hardmask processes and apparatus | George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more | 2017-10-03 |
| 9576811 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more | 2017-02-21 |
| 9558189 | Integrated architecture and network for archiving, processing, association, distribution and display of media | Nicholas J. Dauderman, Tadeusz Peter Matuchniak, SPYROS J. LAZARIS, Clifford Duvernois | 2017-01-31 |
| 9391267 | Method to etch non-volatile metal materials | Meihua Shen, Harmeet Singh, Samantha Tan, Thorsten Lill, Richard Janek +2 more | 2016-07-12 |