| 12510825 |
Photoresist development with halide chemistries |
Sandra Liliana Tan, Jengyi Yu, Da Li, Yiwen FAN, Yan-Quan Pan +5 more |
2025-12-30 |
|
| 12510826 |
Photoresist development with halide chemistries |
Sandra Liliana Tan, Jengyi Yu, Da Li, Yiwen FAN, Yan-Quan Pan +5 more |
2025-12-30 |
|
| 12419499 |
Endoscopic multifunctional accessory channel device |
Steve Schomisch, Ryan Juza, Amitabh Chak |
2025-09-23 |
|
| 12376875 |
Endoscopic tissue resection device |
Amitabh Chak, Steve Schomisch, Ryan Juza |
2025-08-05 |
|
| 12119243 |
Plasma etching chemistries of high aspect ratio features in dielectrics |
Keren Jacobs Kanarik, Samantha Tan, Yang Pan |
2024-10-15 |
$173,043,000 |
| 12105422 |
Photoresist development with halide chemistries |
Samantha Tan, Jengyi Yu, Da Li, Yiwen FAN, Yang Pan +5 more |
2024-10-01 |
$207,578,000 |
| 11594429 |
Plasma etching chemistries of high aspect ratio features in dielectrics |
Keren Jacobs Kanarik, Samantha Tan, Yang Pan |
2023-02-28 |
$186,503,000 |
| 11209729 |
Vacuum-integrated hardmask processes and apparatus |
George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more |
2021-12-28 |
$423,435,000 |
| 10831096 |
Vacuum-integrated hardmask processes and apparatus |
George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more |
2020-11-10 |
$83,083,000 |
| 10825680 |
Directional deposition on patterned structures |
Alexander Kabansky, Samantha Tan, Yang Pan |
2020-11-03 |
$88,965,000 |
| 10749103 |
Dry plasma etch method to pattern MRAM stack |
Samantha Tan, Taeseung Kim, Wenbing Yang, Thorsten Lill |
2020-08-18 |
$99,334,000 |
| 10606880 |
Integrated architecture and network for arrangement and delivery of media |
Nicholas J. Dauderman, Tadeusz Peter Matuchniak, SPYROS J. LAZARIS |
2020-03-31 |
|
| 10515816 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) |
Keren Jacobs Kanarik, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more |
2019-12-24 |
$46,593,000 |
| 10514598 |
Vacuum-integrated hardmask processes and apparatus |
George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more |
2019-12-24 |
$46,593,000 |
| 10374144 |
Dry plasma etch method to pattern MRAM stack |
Samantha Tan, Taeseung Kim, Wenbing Yang, Thorsten Lill |
2019-08-06 |
$34,626,000 |
| 10304659 |
Ale smoothness: in and outside semiconductor industry |
Keren Jacobs Kanarik, Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan +1 more |
2019-05-28 |
$16,840,000 |
| 10186426 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) |
Keren Jacobs Kanarik, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more |
2019-01-22 |
$50,002,000 |
| 10096487 |
Atomic layer etching of tungsten and other metals |
Wenbing Yang, Samantha Tan, Keren Jacobs Kanarik, Taeseung Kim, Meihua Shen +1 more |
2018-10-09 |
$18,504,000 |
| 10056264 |
Atomic layer etching of GaN and other III-V materials |
Wenbing Yang, Tomihito Ohba, Samantha Tan, Keren Jacobs Kanarik, Kazuo Nojiri |
2018-08-21 |
$41,269,000 |
| 9984858 |
ALE smoothness: in and outside semiconductor industry |
Keren Jacobs Kanarik, Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan +1 more |
2018-05-29 |
$79,057,000 |
| 9934225 |
Integrated architecture and network for arrangement and delivery of media |
Nicholas J. Dauderman, Tadeusz Peter Matuchniak, SPYROS J. LAZARIS, Clifford Duvernois |
2018-04-03 |
|
| 9805941 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) |
Keren Jacobs Kanarik, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more |
2017-10-31 |
$46,599,000 |
| 9806252 |
Dry plasma etch method to pattern MRAM stack |
Samantha Tan, Taeseung Kim, Wenbing Yang, Thorsten Lill |
2017-10-31 |
$46,599,000 |
| 9778561 |
Vacuum-integrated hardmask processes and apparatus |
George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more |
2017-10-03 |
$16,041,000 |
| 9576811 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) |
Keren Jacobs Kanarik, Harmeet Singh, Samantha Tan, Alexander Kabansky, Wenbing Yang +3 more |
2017-02-21 |
$45,528,000 |
