Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Vacuum-integrated hardmask processes and apparatus

Vacuum-integrated hardmask processes and apparatus

US Patent 9778561 · Granted Oct 3, 2017

Estimated economic value: $16,041,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photoresist development with halide chemistries2025
Photoresist development with halide chemistries2025
Photoresist development with halide chemistries2025
Photoresist development with halide chemistries2025
Plasma enhanced atomic layer deposition of silicon-containing films2025
System and method for performing alignment and overlay measurement through an op2025
Dynamic precursor dosing for atomic layer deposition2025
Modulated atomic layer deposition2025
Metal organonitrile precursors for thin film deposition2025
Electronic device fabrication using area-selective deposition2025
Endoscopic multifunctional accessory channel device2025
Multi-station semiconductor processing with independently adjustable pedestals2025