Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12385138 | Plasma-enhanced deposition of film stacks | Jason Dirk Haverkamp, Pramod Subramonium, Joseph L. Womack, Dong Niu, Keith Fox +5 more | 2025-08-12 |
| 11874229 | Apparatus and method for multiple source excitation Raman spectroscopy | — | 2024-01-16 |
| 11808715 | Target for optical measurement of trenches | Nicholas James Keller | 2023-11-07 |
| 11668644 | Opto-acoustic measurement of a transparent film stack | Manjusha Mehendale, Robin Mair, Nicholas James Keller | 2023-06-06 |
| 11209729 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more | 2021-12-28 |
| 11162897 | Optical metrology device using numerical aperture reduction | Troy Daniel Ribaudo, Michael J. Hammond | 2021-11-02 |
| 10901241 | Optical metrology system using infrared wavelengths | Troy Daniel Ribaudo | 2021-01-26 |
| 10831096 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more | 2020-11-10 |
| 10775149 | Light source failure identification in an optical metrology device | Troy Daniel Ribaudo | 2020-09-15 |
| 10514598 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more | 2019-12-24 |
| 10288408 | Scanning white-light interferometry system for characterization of patterned semiconductor features | Nigel P. Smith | 2019-05-14 |
| 10240236 | Clean resistant windows for ultraviolet thermal processing | James Lee, Kevin McLaughlin, Andrew John McKerrow, Curtis Bailey, Alexander R. Fox +5 more | 2019-03-26 |
| 10214816 | PECVD apparatus for in-situ deposition of film stacks | Jason Dirk Haverkamp, Pramod Subramonium, Joseph L. Womack, Dong Niu, Keith Fox +5 more | 2019-02-26 |
| 10049921 | Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor | Nerissa Draeger, Kaihan Ashtiani, Deenesh Padhi, Derek Wong, Bart J. van Schravendijk +3 more | 2018-08-14 |
| 10037905 | UV and reducing treatment for K recovery and surface clean in semiconductor processing | Bhadri N. Varadarajan, Bart J. van Schravendijk | 2018-07-31 |
| 9865501 | Method and apparatus for remote plasma treatment for reducing metal oxides on a metal seed layer | Tighe A. Spurlin, Natalia V. Doubina, James E. Duncan, Jonathan D. Reid, David W. Porter | 2018-01-09 |
| 9778561 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie, Thomas Knisley +3 more | 2017-10-03 |
| 9502255 | Low-k damage repair and pore sealing agents with photosensitive end groups | Andrew John McKerrow | 2016-11-22 |
| 9337068 | Oxygen-containing ceramic hard masks and associated wet-cleans | Alice Hollister, Sirish Reddy | 2016-05-10 |
| 9245739 | Low-K oxide deposition by hydrolysis and condensation | Nicholas Muga Ndiege, Krishna Nittala, Derek Wong, Nerissa Draeger, Patrick A. Van Cleemput | 2016-01-26 |
| 9070750 | Methods for reducing metal oxide surfaces to modified metal surfaces using a gaseous reducing environment | Tighe A. Spurlin, Darcy E. Lambert, Durgalakshmi Singhal | 2015-06-30 |
| 9028924 | In-situ deposition of film stacks | Jason Dirk Haverkamp, Pramod Subramonium, Joe Womack, Dong Niu, Keith Fox +5 more | 2015-05-12 |
| 8846525 | Hardmask materials | Vishwanathan Rangarajan, Ananda Banerji, Bart J. van Schravendijk | 2014-09-30 |
| 8741394 | In-situ deposition of film stacks | Jason Dirk Haverkamp, Pramod Subramonium, Joe Womack, Dong Niu, Keith Fox +5 more | 2014-06-03 |
| 8709551 | Smooth silicon-containing films | Keith Fox, Dong Niu, Joe Womack, Mandyam Sriram, Bart J. van Schravendijk +1 more | 2014-04-29 |