Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12334358 | Integration processes utilizing boron-doped silicon materials | Takehito Koshizawa, Karthik Janakiraman, Rui Cheng, Menghui Li, Ming-Yuan Chuang +8 more | 2025-06-17 |
| 12205818 | Boron concentration tunability in boron-silicon films | Yi Yang, Rui Cheng, Karthik Janakiraman, Diwakar Kedlaya, Zubin Huang +1 more | 2025-01-21 |
| 12131913 | Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers | Sarah Michelle Bobek, Kwangduk Douglas Lee, Ratsamee Limdulpaiboon, Dimitri Kioussis, Karthik Janakiraman | 2024-10-29 |
| 12106958 | Method of using dual frequency RF power in a process chamber | Anup K. Singh, Rick Kustra, Vinayak Vishwanath Hassan, Bhaskar Kumar, Pramit Manna +2 more | 2024-10-01 |
| 11961739 | Boron concentration tunability in boron-silicon films | Yi Yang, Rui Cheng, Karthik Janakiraman, Diwakar Kedlaya, Zubin Huang +1 more | 2024-04-16 |
| 11939674 | Methods to reduce material surface roughness | Yi Yang, Karthik Janakiraman, Aykut Aydin, Diwakar Kedlaya | 2024-03-26 |
| 11827514 | Amorphous silicon-based films resistant to crystallization | Aykut Aydin, Karthik Janakiraman, Yi Yang, Gautam K. Hemani | 2023-11-28 |
| 11721545 | Method of using dual frequency RF power in a process chamber | Anup K. Singh, Rick Kustra, Vinayak Vishwanath Hassan, Bhaskar Kumar, Pramit Manna +2 more | 2023-08-08 |
| 11694902 | Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers | Sarah Michelle Bobek, Kwangduk Douglas Lee, Ratsamee Limdulpaiboon, Dimitri Kioussis, Karthik Janakiraman | 2023-07-04 |
| 11676813 | Doping semiconductor films | Aykut Aydin, Rui Cheng, Yi Yang, Karthik Janakiraman, Bo Qi +1 more | 2023-06-13 |
| 11618949 | Methods to reduce material surface roughness | Yi Yang, Karthik Janakiraman, Aykut Aydin, Diwakar Kedlaya | 2023-04-04 |
| 11562902 | Hydrogen management in plasma deposited films | Rui Cheng, Diwakar Kedlaya, Karthik Janakiraman, Gautam K. Hemani, Alicia J. Lustgraaf +4 more | 2023-01-24 |
| 11532525 | Controlling concentration profiles for deposited films using machine learning | Anton Baryshnikov, Aykut Aydin, Zubin Huang, Rui Cheng, Yi Yang +3 more | 2022-12-20 |
| 11508611 | Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films | Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Praket P. Jha | 2022-11-22 |
| 11443919 | Film formation via pulsed RF plasma | Diwakar Kedlaya, Karthik Janakiraman, Yi Yang, Rui Cheng | 2022-09-13 |
| 11421324 | Hardmasks and processes for forming hardmasks by plasma-enhanced chemical vapor deposition | Jui-Yuan Hsu, Pramit Manna, Karthik Janakiraman | 2022-08-23 |
| 11170990 | Polysilicon liners | Rui Cheng, Karthik Janakiraman, Praket P. Jha, Jinrui GUO, Jingmei Liang | 2021-11-09 |
| 10490436 | Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films | Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Praket P. Jha | 2019-11-26 |
| 9245739 | Low-K oxide deposition by hydrolysis and condensation | Nicholas Muga Ndiege, Derek Wong, George Andrew Antonelli, Nerissa Draeger, Patrick A. Van Cleemput | 2016-01-26 |