Issued Patents All Time
Showing 25 most recent of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12374584 | Multi color stack for self aligned dual pattern formation for multi purpose device structures | Suketu Arun Parikh, Martin Jay Seamons, Shuchi Sunil Ojha, Tom Choi, Nitin K. Ingle +1 more | 2025-07-29 |
| 12334337 | Integrated flowable low-k gap-fill and plasma treatment | Myungsun Kim, Martin Jay Seamons, Michael Stolfi, Benjamin Colombeau | 2025-06-17 |
| 12230499 | Methods of post treating silicon nitride based dielectric films with high energy low dose plasma | Yong Sun, Jung Chan Lee, Shuchi Sunil Ojha, Praket P. Jha | 2025-02-18 |
| 12094709 | Plasma treatment process to densify oxide layers | Jung Chan Lee, Mun Kyu Park, Jun Seok Lee, Euhngi Lee, Kyu-Ha Shim +5 more | 2024-09-17 |
| 12046508 | Method of dielectric material fill and treatment | Shi YOU, He Ren, Naomi Yoshida, Nikolaos Bekiaris, Mehul Naik +2 more | 2024-07-23 |
| 11967524 | 3D NAND gate stack reinforcement | Praket P. Jha, Shuchi Sunil Ojha, Abhijit Basu Mallick, Shankar Venkataraman | 2024-04-23 |
| 11804372 | CD dependent gap fill and conformal films | Jung Chan Lee, Praket P. Jha, Jinrui GUO, Wenhui Li | 2023-10-31 |
| 11615984 | Method of dielectric material fill and treatment | Shi YOU, He Ren, Naomi Yoshida, Nikolaos Bekiaris, Mehul Naik +2 more | 2023-03-28 |
| 11469100 | Methods of post treating dielectric films with microwave radiation | Yong Sun, Praket P. Jha, Martin Jay Seamons, Dongqing Li, Shashank Sharma +2 more | 2022-10-11 |
| 11367614 | Surface roughness for flowable CVD film | Jinrui GUO, Praket P. Jha, Li Zhang | 2022-06-21 |
| 11170990 | Polysilicon liners | Krishna Nittala, Rui Cheng, Karthik Janakiraman, Praket P. Jha, Jinrui GUO | 2021-11-09 |
| 11170994 | CD dependent gap fill and conformal films | Jung Chan Lee, Praket P. Jha, Jinrui GUO, Wenhui Li | 2021-11-09 |
| 11152248 | Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions | Yong Sun, Jinrui GUO, Praket P. Jha, Jung Chan Lee, Tza-Jing Gung +1 more | 2021-10-19 |
| 11133177 | Oxidation reduction for SiOC film | Martin Jay Seamons, Michael Wenyoung Tsiang | 2021-09-28 |
| 11107674 | Methods for depositing silicon nitride | Lakmal C. Kalutarage, Mark Saly, Praket P. Jha | 2021-08-31 |
| 11090683 | Cure method for cross-linking Si-hydroxyl bonds | Martin Jay Seamons, Byung Kook Ahn | 2021-08-17 |
| 10934620 | Integration of dual remote plasmas sources for flowable CVD | Ying Ma, Daemian Raj, Jay D. Pinson, II, Dongqing Li, Yizhen Zhang | 2021-03-02 |
| 10707116 | Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions | Yong Sun, Jinrui GUO, Praket P. Jha, Jung Chan Lee, Tza-Jing Gung +1 more | 2020-07-07 |
| 10041167 | Cyclic sequential processes for forming high quality thin films | Jung Chan Lee, Jinrui GUO, Mukund Srinivasan | 2018-08-07 |
| 9896326 | FCVD line bending resolution by deposition modulation | Kiran V. Thadani, Jessica S. Kachian, Nagarajan Rajagopalan | 2018-02-20 |
| 9570287 | Flowable film curing penetration depth improvement and stress tuning | Jung Chan Lee, Yong Sun | 2017-02-14 |
| 9412581 | Low-K dielectric gapfill by flowable deposition | Kiran V. Thadani, Young S. Lee, Mukund Srinivasan | 2016-08-09 |
| 9404178 | Surface treatment and deposition for reduced outgassing | Xiaolin Chen, Nitin K. Ingle, Shankar Venkataraman | 2016-08-02 |
| 9018108 | Low shrinkage dielectric films | Sukwon Hong, Toan Q. Tran, Abhijit Basu Mallick, Nitin K. Ingle | 2015-04-28 |
| 8975152 | Methods of reducing substrate dislocation during gapfill processing | Sukwon Hong, Hiroshi Hamana | 2015-03-10 |