Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12142475 | Sequential plasma and thermal treatment | Ning Li, Shuaidi Zhang, Mihaela Balseanu, Qi Gao, Rajesh Prasad +3 more | 2024-11-12 |
| 12094709 | Plasma treatment process to densify oxide layers | Jung Chan Lee, Mun Kyu Park, Jun Seok Lee, Euhngi Lee, Deven Matthew Raj Mittal +5 more | 2024-09-17 |
| 11728383 | Localized stressor formation by ion implantation | Sipeng Gu, Wei Zou, Qintao Zhang | 2023-08-15 |
| 11664419 | Isolation method to enable continuous channel layer | Sipeng Gu, Wei Zou | 2023-05-30 |
| 11594441 | Handling for high resistivity substrates | Sipeng Gu | 2023-02-28 |
| 11114299 | Techniques for reducing tip to tip shorting and critical dimension variation during nanoscale patterning | Qintao Zhang, Rajesh Prasad | 2021-09-07 |
| 10930508 | Replacement metal gate formation of PMOS ultra-low voltage devices using a thermal implant | Qintao Zhang | 2021-02-23 |
| 10811257 | Techniques for forming low stress etch-resistant mask using implantation | Rajesh Prasad, Tzu-Yu Liu, Tom Ho Wing Yu, Zhong Qiang Hua, Adolph Miller Allen +3 more | 2020-10-20 |
| 10354875 | Techniques for improved removal of sacrificial mask | Rajesh Prasad, Ning Zhan, Tzu-Yu Liu, James Cournoyer, Kwangduk Douglas Lee +4 more | 2019-07-16 |
| 10332748 | Etch rate modulation through ion implantation | Rajesh Prasad, Steven R. Sherman, Andrew Waite, Sungho Jo, Guy Oteri +1 more | 2019-06-25 |
| 10204909 | Non-uniform gate oxide thickness for DRAM device | Simon Ruffell, Arvind Kumar, Tristan Y. Ma, John Hautala, Steven R. Sherman | 2019-02-12 |
| 9934982 | Etch rate modulation through ion implantation | Rajesh Prasad, Steven R. Sherman, Andrew Waite, Sungho Jo, Guy Oteri +1 more | 2018-04-03 |
| 8716155 | Method to enhance charge trapping | Deepak A. Ramappa | 2014-05-06 |
| 8283265 | Method to enhance charge trapping | Deepak A. Ramappa | 2012-10-09 |
| 8012843 | Optimized halo or pocket cold implants | Christopher R. Hatem, Benjamin Colombeau, Thirumal Thanigaivelan, Dennis Rodier | 2011-09-06 |
| 7993698 | Techniques for temperature controlled ion implantation | Julian G. Blake, Jonathan Gerald England, Scott C. Holden, Steven R. Walther, Reuel B. Liebert +4 more | 2011-08-09 |