Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12422210 | Techniques and device structures based upon directional dielectric deposition and bottom-up fill | M. Arif Zeeshan, Kelvin Chan | 2025-09-23 |
| 12191156 | Ribbon beam plasma enhanced chemical vapor deposition system for anisotropic deposition of thin films | John Hautala, Peter F. Kurunczi | 2025-01-07 |
| 11942361 | Semiconductor device cavity formation using directional deposition | Armin Saeedi Vahdat, Johannes M. van Meer, John Hautala, Naushad K. Variam | 2024-03-26 |
| 11778832 | Wordline contact formation in NAND devices | Armin Saeedi Vahdat, Johannes M. van Meer, John Hautala, Naushad K. Variam | 2023-10-03 |
| 11459652 | Techniques and device structures based upon directional dielectric deposition and bottom-up fill | M. Arif Zeeshan, Kelvin Chan | 2022-10-04 |
| 10990014 | Performance improvement of EUV photoresist by ion implantation | Huixiong Dai, Anthony Renau, John Hautala, Joseph C. Olson | 2021-04-27 |
| 10937663 | Selective photoresist etching for bridge defect removal | Juiyuan Hsu | 2021-03-02 |
| 10553448 | Techniques for processing a polycrystalline layer using an angled ion beam | Morgan Evans, Kevin Anglin, Robert Masci, John Hautala | 2020-02-04 |
| 10545408 | Performance improvement of EUV photoresist by ion implantation | Huixiong Dai, Anthony Renau, John Hautala, Joseph C. Olson | 2020-01-28 |
| 10310379 | Multiple patterning approach using ion implantation | Maureen Petterson, John Hautala, Steven R. Sherman | 2019-06-04 |
| 10269663 | Critical dimensions variance compensation | Morgan Evans, Kevin Anglin, Motoya Okazaki, Johannes M. van Meer | 2019-04-23 |
| 10222202 | Three dimensional structure fabrication control using novel processing system | Morgan Evans, Simon Ruffell, Kevin Anglin | 2019-03-05 |
| 10204909 | Non-uniform gate oxide thickness for DRAM device | Simon Ruffell, Arvind Kumar, Kyu-Ha Shim, John Hautala, Steven R. Sherman | 2019-02-12 |
| 10002764 | Sputter etch material selectivity | Kevin Anglin, Morgan Evans, John Hautala, Heyun Yin | 2018-06-19 |
| 9929015 | High efficiency apparatus and method for depositing a layer on a three dimensional structure | Thomas R. Omstead, Simon Ruffell, Ethan A. Wright, John Hautala | 2018-03-27 |
| 9885957 | Ion-assisted deposition and implantation of photoresist to improve line edge roughness | Maureen Petterson, John Hautala | 2018-02-06 |
| 9735013 | Ion implantation for improved contact hole critical dimension uniformity | John Hautala, Maureen Petterson, Boya Cui | 2017-08-15 |
| 9659784 | Ion-assisted deposition and implantation of photoresist to improve line edge roughness | Maureen Petterson, John Hautala | 2017-05-23 |
| 9520290 | Ion implantation for improved etch performance | Maureen Petterson | 2016-12-13 |
| 9512517 | Multiple exposure treatment for processing a patterning feature | Maureen Petterson, John Hautala, Ludovic Godet | 2016-12-06 |
| 9460961 | Techniques and apparatus for anisotropic metal etching | Thomas R. Omstead, Ludovic Godet | 2016-10-04 |
| 9435038 | Ion implant assisted metal etching | Thomas R. Omstead, William Davis Lee | 2016-09-06 |
| 9396965 | Techniques and apparatus for anisotropic metal etching | Ludovic Godet, Thomas R. Omstead | 2016-07-19 |
| 9385219 | Method and apparatus for selective deposition | Ellie Yieh, Srinivas D. Nemani, Ludovic Godet, Yin Fan | 2016-07-05 |
| 9377692 | Electric/magnetic field guided acid diffusion | Peng Xie, Ludovic Godet, Joseph C. Olson, Christopher Dennis Bencher | 2016-06-28 |