| 12372874 |
System architecture of manufacturing of semiconductor wafers |
Dmitry Lubomirsky, Huixiong Dai |
2025-07-29 |
|
| 12347674 |
Directional selective deposition |
Bhargav S. Citla, Soham Asrani, Joshua Rubnitz, Srinivas D. Nemani |
2025-07-01 |
|
| 12315718 |
Forming films with improved film quality |
Bhargav S. Citla, Srinivas D. Nemani, Purvam Modi |
2025-05-27 |
|
| 12305279 |
Ultra high-k hafnium oxide and hafnium zirconium oxide films |
Harshil Kashyap, Andrew C. Kummel, Ajay Kumar Yadav, Keith Tatseun Wong, Srinivas D. Nemani |
2025-05-20 |
|
| 12288672 |
Methods and apparatus for carbon compound film deposition |
Qiwei Liang, Srinivas D. Nemani, Chentsau Chris Ying, Erica Chen, Nithin Thomas ALEX |
2025-04-29 |
|
| 12262559 |
Monolithic complementary field-effect transistors having carbon-doped release layers |
Andrew Cockburn, Vanessa Pena, Daniel Philippe Cellier, John Tolle, Thomas Kirschenheiter +3 more |
2025-03-25 |
|
| 12204246 |
Metal oxide resist patterning with electrical field guided post-exposure bake |
Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Steven Hiloong WELCH, Dmitry Lubomirsky |
2025-01-21 |
|
| 12181801 |
Chamber and methods of treating a substrate after exposure to radiation |
Dmitry Lubomirsky, Douglas A. Buchberger, Jr., Qiwei Liang, Hyunjun Kim |
2024-12-31 |
$49,330,000 |
| 12085858 |
Photoresist patterning process |
Huixiong Dai, Srinivas D. Nemani, Steven Hiloong WELCH, Mangesh Ashok BANGAR |
2024-09-10 |
$81,152,000 |
| 11955333 |
Methods and apparatus for processing a substrate |
Jethro Tannos, Bhargav S. Citla, Srinivas D. Nemani, Joshua Rubnitz, Erica Chen +3 more |
2024-04-09 |
$47,694,000 |
| 11914299 |
Lithography process window enhancement for photoresist patterning |
Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Christopher S. Ngai |
2024-02-27 |
$57,915,000 |
| 11881411 |
High pressure annealing process for metal containing materials |
Kaushal K. Singh, Mei-Yee Shek, Srinivas D. Nemani |
2024-01-23 |
$48,508,000 |
| 11880137 |
Film structure for electric field guided photoresist patterning process |
Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Steven Hiloong WELCH, Christopher S. Ngai |
2024-01-23 |
$48,508,000 |
| 11862458 |
Directional selective deposition |
Bhargav S. Citla, Soham Asrani, Joshua Rubnitz, Srinivas D. Nemani |
2024-01-02 |
$40,045,000 |
| 11798606 |
Additive patterning of semiconductor film stacks |
John O. Dukovic, Srinivas D. Nemani, Praburam Gopalraja, Steven Hiloong WELCH, Bhargav S. Citla |
2023-10-24 |
$34,065,000 |
| 11764058 |
Three-color 3D DRAM stack and methods of making |
Arvind Kumar, Mahendra Pakala, John Tolle, Thomas Kirschenheiter, Anchuan Wang +1 more |
2023-09-19 |
$44,467,000 |
| 11756828 |
Cluster processing system for forming a transition metal material |
Keith Tatseun Wong, Srinivas D. Nemani |
2023-09-12 |
$47,983,000 |
| 11756803 |
Gas delivery system for high pressure processing chamber |
Qiwei Liang, Srinivas D. Nemani, Sean S. Kang, Adib Khan |
2023-09-12 |
$47,983,000 |
| 11705337 |
Tungsten defluorination by high pressure treatment |
Keith Tatseun Wong, Thomas Jongwan Kwon, Sean S. Kang |
2023-07-18 |
$58,990,000 |
| 11682556 |
Methods of improving graphene deposition for processes using microwave surface-wave plasma on dielectric materials |
Jie Zhou, Erica Chen, Qiwei Liang, Chentsau Chris Ying, Srinivas D. Nemani |
2023-06-20 |
$48,645,000 |
| 11650506 |
Film structure for electric field guided photoresist patterning process |
Huixiong Dai, Mangesh Ashok BANGAR, Christopher S. Ngai, Srinivas D. Nemani, Steven Hiloong WELCH |
2023-05-16 |
$64,199,000 |
| 11631591 |
Methods for depositing dielectric material |
Bhargav S. Citla, Jethro Tannos, Jingyi Li, Douglas A. Buchberger, Jr., Zhong Qiang Hua +1 more |
2023-04-18 |
$36,767,000 |
| 11566325 |
Silicon carbonitride gapfill with tunable carbon content |
Mei-Yee Shek, Bhargav S. Citla, Joshua Rubnitz, Jethro Tannos, Chentsau Chris Ying +1 more |
2023-01-31 |
$29,381,000 |
| 11527421 |
Gas delivery system for high pressure processing chamber |
Qiwei Liang, Srinivas D. Nemani, Sean S. Kang, Adib Khan |
2022-12-13 |
|
| 11429026 |
Lithography process window enhancement for photoresist patterning |
Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Christopher S. Ngai |
2022-08-30 |
$41,861,000 |
