Issued Patents All Time
Showing 1–25 of 178 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372874 | System architecture of manufacturing of semiconductor wafers | Dmitry Lubomirsky, Huixiong Dai | 2025-07-29 |
| 12347674 | Directional selective deposition | Bhargav S. Citla, Soham Asrani, Joshua Rubnitz, Srinivas D. Nemani | 2025-07-01 |
| 12315718 | Forming films with improved film quality | Bhargav S. Citla, Srinivas D. Nemani, Purvam Modi | 2025-05-27 |
| 12305279 | Ultra high-k hafnium oxide and hafnium zirconium oxide films | Harshil Kashyap, Andrew C. Kummel, Ajay Kumar Yadav, Keith Tatseun Wong, Srinivas D. Nemani | 2025-05-20 |
| 12288672 | Methods and apparatus for carbon compound film deposition | Qiwei Liang, Srinivas D. Nemani, Chentsau Chris Ying, Erica Chen, Nithin Thomas ALEX | 2025-04-29 |
| 12262559 | Monolithic complementary field-effect transistors having carbon-doped release layers | Andrew Cockburn, Vanessa Pena, Daniel Philippe Cellier, John Tolle, Thomas Kirschenheiter +3 more | 2025-03-25 |
| 12204246 | Metal oxide resist patterning with electrical field guided post-exposure bake | Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Steven Hiloong WELCH, Dmitry Lubomirsky | 2025-01-21 |
| 12181801 | Chamber and methods of treating a substrate after exposure to radiation | Dmitry Lubomirsky, Douglas A. Buchberger, Jr., Qiwei Liang, Hyunjun Kim | 2024-12-31 |
| 12085858 | Photoresist patterning process | Huixiong Dai, Srinivas D. Nemani, Steven Hiloong WELCH, Mangesh Ashok BANGAR | 2024-09-10 |
| 11955333 | Methods and apparatus for processing a substrate | Jethro Tannos, Bhargav S. Citla, Srinivas D. Nemani, Joshua Rubnitz, Erica Chen +3 more | 2024-04-09 |
| 11914299 | Lithography process window enhancement for photoresist patterning | Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Christopher S. Ngai | 2024-02-27 |
| 11881411 | High pressure annealing process for metal containing materials | Kaushal K. Singh, Mei-Yee Shek, Srinivas D. Nemani | 2024-01-23 |
| 11880137 | Film structure for electric field guided photoresist patterning process | Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Steven Hiloong WELCH, Christopher S. Ngai | 2024-01-23 |
| 11862458 | Directional selective deposition | Bhargav S. Citla, Soham Asrani, Joshua Rubnitz, Srinivas D. Nemani | 2024-01-02 |
| 11798606 | Additive patterning of semiconductor film stacks | John O. Dukovic, Srinivas D. Nemani, Praburam Gopalraja, Steven Hiloong WELCH, Bhargav S. Citla | 2023-10-24 |
| 11764058 | Three-color 3D DRAM stack and methods of making | Arvind Kumar, Mahendra Pakala, John Tolle, Thomas Kirschenheiter, Anchuan Wang +1 more | 2023-09-19 |
| 11756828 | Cluster processing system for forming a transition metal material | Keith Tatseun Wong, Srinivas D. Nemani | 2023-09-12 |
| 11756803 | Gas delivery system for high pressure processing chamber | Qiwei Liang, Srinivas D. Nemani, Sean S. Kang, Adib Khan | 2023-09-12 |
| 11705337 | Tungsten defluorination by high pressure treatment | Keith Tatseun Wong, Thomas Jongwan Kwon, Sean S. Kang | 2023-07-18 |
| 11682556 | Methods of improving graphene deposition for processes using microwave surface-wave plasma on dielectric materials | Jie Zhou, Erica Chen, Qiwei Liang, Chentsau Chris Ying, Srinivas D. Nemani | 2023-06-20 |
| 11650506 | Film structure for electric field guided photoresist patterning process | Huixiong Dai, Mangesh Ashok BANGAR, Christopher S. Ngai, Srinivas D. Nemani, Steven Hiloong WELCH | 2023-05-16 |
| 11631591 | Methods for depositing dielectric material | Bhargav S. Citla, Jethro Tannos, Jingyi Li, Douglas A. Buchberger, Jr., Zhong Qiang Hua +1 more | 2023-04-18 |
| 11566325 | Silicon carbonitride gapfill with tunable carbon content | Mei-Yee Shek, Bhargav S. Citla, Joshua Rubnitz, Jethro Tannos, Chentsau Chris Ying +1 more | 2023-01-31 |
| 11527421 | Gas delivery system for high pressure processing chamber | Qiwei Liang, Srinivas D. Nemani, Sean S. Kang, Adib Khan | 2022-12-13 |
| 11429026 | Lithography process window enhancement for photoresist patterning | Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Christopher S. Ngai | 2022-08-30 |