Issued Patents All Time
Showing 1–25 of 121 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12181801 | Chamber and methods of treating a substrate after exposure to radiation | Dmitry Lubomirsky, Qiwei Liang, Hyunjun Kim, Ellie Yieh | 2024-12-31 |
| 12112972 | Rotating biasable pedestal and electrostatic chuck in semiconductor process chamber | Qiwei Liang, Gautam Pisharody, Dmitry Lubomirsky, Shekhar ATHANI | 2024-10-08 |
| 11955333 | Methods and apparatus for processing a substrate | Jethro Tannos, Bhargav S. Citla, Srinivas D. Nemani, Ellie Yieh, Joshua Rubnitz +3 more | 2024-04-09 |
| 11934103 | Apparatus for post exposure bake of photoresist | Dmitry Lubomirsky, John O. Dukovic, Srinivas D. Nemani | 2024-03-19 |
| 11899366 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2024-02-13 |
| 11815816 | Apparatus for post exposure bake of photoresist | Dmitry Lubomirsky, John O. Dukovic, Srinivas D. Nemani | 2023-11-14 |
| 11631591 | Methods for depositing dielectric material | Bhargav S. Citla, Jethro Tannos, Jingyi Li, Zhong Qiang Hua, Srinivas D. Nemani +1 more | 2023-04-18 |
| 11609505 | Apparatus and methods for verification and re-use of process fluids | Mangesh Ashok BANGAR, Gautam Pisharody, Lancelot HUANG, Alan Tso, Huixiong Dai +3 more | 2023-03-21 |
| 11555730 | In-situ method and apparatus for measuring fluid resistivity | Gautam Pisharody, Lancelot HUANG | 2023-01-17 |
| 11387071 | Multi-source ion beam etch system | Qiwei Liang, Srinivas D. Nemani, Ellie Yieh, Chentsau Chris Ying | 2022-07-12 |
| 11315760 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2022-04-26 |
| 11112697 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2021-09-07 |
| 11114306 | Methods for depositing dielectric material | Bhargav S. Citla, Jethro Tannos, Jingyi Li, Zhong Qiang Hua, Srinivas D. Nemani +1 more | 2021-09-07 |
| 11088005 | Electrostatic chuck having thermally isolated zones with minimal crosstalk | Vijay D. Parkhe, Konstantin Makhratchev, Jason C. Della Rosa, Hamid Noobakhsh, Brad L. Mays | 2021-08-10 |
| 10854425 | Feedforward temperature control for plasma processing apparatus | Chetan Mahadeswaraswamy, Walter R. Merry, Sergio Fukuda Shoji, Chunlei Zhang, Yashaswini B. Pattar +7 more | 2020-12-01 |
| 10770328 | Substrate support with symmetrical feed structure | Xing Lin, Xiaoping Zhou, Andrew Nguyen, Anchel Sheyner | 2020-09-08 |
| 10615006 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-04-07 |
| 10580620 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-03-03 |
| 10546728 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-01-28 |
| 10535502 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-01-14 |
| 10474033 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-11-12 |
| 10453656 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2019-10-22 |
| 10386126 | Apparatus for controlling temperature uniformity of a substrate | Kallol Bera, Xiaoping Zhou, Andrew Nguyen, Hamid Tavassoli, Surajit Kumar +1 more | 2019-08-20 |
| 10304715 | Electrostatic chuck having thermally isolated zones with minimal crosstalk | Vijay D. Parkhe, Konstantin Makhratchev, Jason Della Rosa, Hamid Noorbakhsh, Brad L. Mays | 2019-05-28 |
| 10203604 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-02-12 |