Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12288672 | Methods and apparatus for carbon compound film deposition | Qiwei Liang, Srinivas D. Nemani, Ellie Yieh, Erica Chen, Nithin Thomas ALEX | 2025-04-29 |
| 12201030 | Spin-orbit torque MRAM structure and manufacture thereof | Minrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel +5 more | 2025-01-14 |
| 11723283 | Spin-orbit torque MRAM structure and manufacture thereof | Minrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel +5 more | 2023-08-08 |
| 11682556 | Methods of improving graphene deposition for processes using microwave surface-wave plasma on dielectric materials | Jie Zhou, Erica Chen, Qiwei Liang, Srinivas D. Nemani, Ellie Yieh | 2023-06-20 |
| 11566325 | Silicon carbonitride gapfill with tunable carbon content | Mei-Yee Shek, Bhargav S. Citla, Joshua Rubnitz, Jethro Tannos, Srinivas D. Nemani +1 more | 2023-01-31 |
| 11384428 | Carbon layer covered mask in 3D applications | Mang-Mang Ling, Thomas Jongwan Kwon, Jong Mun Kim | 2022-07-12 |
| 11387071 | Multi-source ion beam etch system | Qiwei Liang, Srinivas D. Nemani, Ellie Yieh, Douglas A. Buchberger, Jr. | 2022-07-12 |
| 11289331 | Methods for graphene formation using microwave surface-wave plasma on dielectric materials | Jie Zhou, Erica Chen, Qiwei Liang, Srinivas D. Nemani, Ellie Yieh | 2022-03-29 |
| 11289342 | Damage free metal conductor formation | He Ren, Jong Mun Kim, Maximillian Clemons, Minrui Yu, Mehul Naik | 2022-03-29 |
| 11145808 | Methods for etching a structure for MRAM applications | Jong Mun Kim, Minrui Yu, Chando Park, Mang-Mang Ling, Jaesoo Ahn +3 more | 2021-10-12 |
| 11049731 | Methods for film modification | Erica Chen, Bhargav S. Citla, Jethro Tannos, Matthew August Mattson | 2021-06-29 |
| 10957548 | Method of etching copper indium gallium selenide (CIGS) material | Mang-Mang Ling, Jong Mun Kim | 2021-03-23 |
| 10916433 | Methods of forming metal silicide layers and metal silicide layers formed therefrom | He Ren, Maximillian Clemons, Mei-Yee Shek, Minrui Yu, Bencherki Mebarki +2 more | 2021-02-09 |
| 10692734 | Methods of patterning nickel silicide layers on a semiconductor device | Jong Mun Kim, He Ren, Srinivas D. Nemani, Ellie Yieh | 2020-06-23 |
| 10685849 | Damage free metal conductor formation | He Ren, Jong Mun Kim, Maximillian Clemons, Minrui Yu, Mehul Naik | 2020-06-16 |
| 10128337 | Methods for forming fin structures with desired profile for 3D structure semiconductor applications | Jie Zhou, Zhong Qiang Hua, Srinivas D. Nemani, Ellie Yieh | 2018-11-13 |