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Methods and apparatus for carbon compound film deposition |
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Spin-orbit torque MRAM structure and manufacture thereof |
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Spin-orbit torque MRAM structure and manufacture thereof |
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Methods of improving graphene deposition for processes using microwave surface-wave plasma on dielectric materials |
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Silicon carbonitride gapfill with tunable carbon content |
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2023-01-31 |
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Carbon layer covered mask in 3D applications |
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2022-07-12 |
| 11387071 |
Multi-source ion beam etch system |
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2022-07-12 |
| 11289331 |
Methods for graphene formation using microwave surface-wave plasma on dielectric materials |
Jie Zhou, Erica Chen, Qiwei Liang, Srinivas D. Nemani, Ellie Yieh |
2022-03-29 |
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Damage free metal conductor formation |
He Ren, Jong Mun Kim, Maximillian Clemons, Minrui Yu, Mehul Naik |
2022-03-29 |
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Methods for etching a structure for MRAM applications |
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Methods for film modification |
Erica Chen, Bhargav S. Citla, Jethro Tannos, Matthew August Mattson |
2021-06-29 |
| 10957548 |
Method of etching copper indium gallium selenide (CIGS) material |
Mang-Mang Ling, Jong Mun Kim |
2021-03-23 |
| 10916433 |
Methods of forming metal silicide layers and metal silicide layers formed therefrom |
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| 10692734 |
Methods of patterning nickel silicide layers on a semiconductor device |
Jong Mun Kim, He Ren, Srinivas D. Nemani, Ellie Yieh |
2020-06-23 |
| 10685849 |
Damage free metal conductor formation |
He Ren, Jong Mun Kim, Maximillian Clemons, Minrui Yu, Mehul Naik |
2020-06-16 |
| 10128337 |
Methods for forming fin structures with desired profile for 3D structure semiconductor applications |
Jie Zhou, Zhong Qiang Hua, Srinivas D. Nemani, Ellie Yieh |
2018-11-13 |