| 12288672 |
Methods and apparatus for carbon compound film deposition |
Qiwei Liang, Srinivas D. Nemani, Ellie Yieh, Erica Chen, Nithin Thomas ALEX |
2025-04-29 |
|
| 12201030 |
Spin-orbit torque MRAM structure and manufacture thereof |
Minrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel +5 more |
2025-01-14 |
|
| 11723283 |
Spin-orbit torque MRAM structure and manufacture thereof |
Minrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel +5 more |
2023-08-08 |
$46,911,000 |
| 11682556 |
Methods of improving graphene deposition for processes using microwave surface-wave plasma on dielectric materials |
Jie Zhou, Erica Chen, Qiwei Liang, Srinivas D. Nemani, Ellie Yieh |
2023-06-20 |
$48,645,000 |
| 11566325 |
Silicon carbonitride gapfill with tunable carbon content |
Mei-Yee Shek, Bhargav S. Citla, Joshua Rubnitz, Jethro Tannos, Srinivas D. Nemani +1 more |
2023-01-31 |
$29,381,000 |
| 11387071 |
Multi-source ion beam etch system |
Qiwei Liang, Srinivas D. Nemani, Ellie Yieh, Douglas A. Buchberger, Jr. |
2022-07-12 |
$30,931,000 |
| 11384428 |
Carbon layer covered mask in 3D applications |
Mang-Mang Ling, Thomas Jongwan Kwon, Jong Mun Kim |
2022-07-12 |
$30,931,000 |
| 11289331 |
Methods for graphene formation using microwave surface-wave plasma on dielectric materials |
Jie Zhou, Erica Chen, Qiwei Liang, Srinivas D. Nemani, Ellie Yieh |
2022-03-29 |
$46,373,000 |
| 11289342 |
Damage free metal conductor formation |
He Ren, Jong Mun Kim, Maximillian Clemons, Minrui Yu, Mehul Naik |
2022-03-29 |
$46,373,000 |
| 11145808 |
Methods for etching a structure for MRAM applications |
Jong Mun Kim, Minrui Yu, Chando Park, Mang-Mang Ling, Jaesoo Ahn +3 more |
2021-10-12 |
$163,741,000 |
| 11049731 |
Methods for film modification |
Erica Chen, Bhargav S. Citla, Jethro Tannos, Matthew August Mattson |
2021-06-29 |
$47,858,000 |
| 10957548 |
Method of etching copper indium gallium selenide (CIGS) material |
Mang-Mang Ling, Jong Mun Kim |
2021-03-23 |
$48,969,000 |
| 10916433 |
Methods of forming metal silicide layers and metal silicide layers formed therefrom |
He Ren, Maximillian Clemons, Mei-Yee Shek, Minrui Yu, Bencherki Mebarki +2 more |
2021-02-09 |
$118,884,000 |
| 10692734 |
Methods of patterning nickel silicide layers on a semiconductor device |
Jong Mun Kim, He Ren, Srinivas D. Nemani, Ellie Yieh |
2020-06-23 |
$29,749,000 |
| 10685849 |
Damage free metal conductor formation |
He Ren, Jong Mun Kim, Maximillian Clemons, Minrui Yu, Mehul Naik |
2020-06-16 |
$36,933,000 |
| 10128337 |
Methods for forming fin structures with desired profile for 3D structure semiconductor applications |
Jie Zhou, Zhong Qiang Hua, Srinivas D. Nemani, Ellie Yieh |
2018-11-13 |
$24,133,000 |
