Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12300497 | Method and apparatus of low temperature plasma enhanced chemical vapor deposition of graphene | Thai Cheng Chua, Christian Valencia, Chikuang Charles Wang, Hanh Nguyen, Philip Allan Kraus | 2025-05-13 |
| 11851740 | PVD directional deposition for encapsulation | Ludovic Godet, Jinxin FU | 2023-12-26 |
| 11776805 | Selective oxidation and simplified pre-clean | Joung Joo Lee, Yi Xu, Yu Lei, Xianmin Tang, Kelvin Chan +2 more | 2023-10-03 |
| 11189710 | Method of forming a bottom isolation dielectric by directional sputtering of a capping layer over a pair of stacks | Byeong-Chan Lee, Tejinder Singh | 2021-11-30 |
| 11170982 | Methods and apparatus for producing low angle depositions | Anantha K. Subramani, Praburam Gopal Raja, Steven V. Sansoni, John C. Forster, Philip Allan Kraus +5 more | 2021-11-09 |
| 10950448 | Film quality control in a linear scan physical vapor deposition process | Joung Joo Lee, Xianmin Tang | 2021-03-16 |
| 10927450 | Methods and apparatus for patterning substrates using asymmetric physical vapor deposition | Wenhui Wang, Huixiong Dai, Christopher S. Ngai, Joung Joo Lee, Xianmin Tang | 2021-02-23 |
| 10927451 | Methods and apparatus for patterning substrates using asymmetric physical vapor deposition | Byeong-Chan Lee, Huixiong Dai, Tejinder Singh, Joung Joo Lee, Xianmin Tang | 2021-02-23 |
| 10930472 | Methods for forming a metal silicide interconnection nanowire structure | Annamalai Lakshmanan, Kaushal K. Singh, Andrew Cockburn, Ludovic Godet, Paul F. Ma +1 more | 2021-02-23 |
| 10916433 | Methods of forming metal silicide layers and metal silicide layers formed therefrom | He Ren, Maximillian Clemons, Mei-Yee Shek, Minrui Yu, Mehul Naik +2 more | 2021-02-09 |
| 10815561 | Method and apparatus for asymmetric selective physical vapor deposition | Joung Joo Lee, Xianmin Tang, Keith A. Miller, Sree Rangasai V. Kesapragada, Sudarsan Srinivasan | 2020-10-27 |
| 10643895 | Self-aligned interconnects formed using subtractive techniques | Huixiong Dai, Yongmei Chen, He Ren, Mehul Naik | 2020-05-05 |
| 10636655 | Methods for asymmetric deposition of metal on high aspect ratio nanostructures | Ben-Li Sheu, Joung Joo Lee, Ismail Emesh, Roey Shaviv, Xianmin Tang | 2020-04-28 |
| 10636704 | Seam-healing method upon supra-atmospheric process in diffusion promoting ambient | Sean S. Kang, Keith Tatseun Wong, He Ren, Mehul Naik, Ellie Yieh +1 more | 2020-04-28 |
| 10593592 | Laminate and core shell formation of silicide nanowire | Annamalai Lakshmanan, Kaushal K. Singh, Paul F. Ma, Mehul Naik, Andrew Cockburn +1 more | 2020-03-17 |
| 10438849 | Microwave anneal to improve CVD metal gap-fill and throughput | He Ren, Jie Zhou, Guannan Chen, Michael W. Stowell, Mehul Naik +3 more | 2019-10-08 |
| 10354882 | Low thermal budget crystallization of amorphous metal silicides | Xianmin Tang, Sundar Ramamurthy, Jerome Machillot | 2019-07-16 |
| 10204764 | Methods for forming a metal silicide interconnection nanowire structure | Annamalai Lakshmanan, Kaushal K. Singh, Andrew Cockburn, Ludovic Godet, Paul F. Ma +1 more | 2019-02-12 |
| 10049927 | Seam-healing method upon supra-atmospheric process in diffusion promoting ambient | Sean S. Kang, Keith Tatseun Wong, He Ren, Mehul Naik, Ellie Yieh +1 more | 2018-08-14 |
| 10014174 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | Pramit Manna, Li Yan Miao, Deenesh Padhi, Bok Hoen Kim, Christopher Dennis Bencher | 2018-07-03 |
| 9865466 | Silicide phase control by confinement | Ellie Yieh, Mehul Naik, Srinivas D. Nemani | 2018-01-09 |
| 9847252 | Methods for forming 2-dimensional self-aligned vias | Srinivas D. Nemani, Mehul Naik | 2017-12-19 |
| 9761489 | Self-aligned interconnects formed using substractive techniques | Huixiong Dai, Yongmei Chen, He Ren, Mehul Naik | 2017-09-12 |
| 9659771 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | Pramit Manna, Li Yan Miao, Deenesh Padhi, Bok Hoen Kim, Christopher Dennis Bencher | 2017-05-23 |
| 9631278 | Metal silicide formation through an intermediate metal halogen compound | David Thompson | 2017-04-25 |