Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11881321 | Device for measuring total gas content of primary circuit of PWR nuclear power | Dong Chen, Tao Hou, Xudong Wu, Gaoyong Liu | 2024-01-23 |
| 10014174 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | Bencherki Mebarki, Pramit Manna, Deenesh Padhi, Bok Hoen Kim, Christopher Dennis Bencher | 2018-07-03 |
| 9659771 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | Bencherki Mebarki, Pramit Manna, Deenesh Padhi, Bok Hoen Kim, Christopher Dennis Bencher | 2017-05-23 |
| 9337051 | Method for critical dimension reduction using conformal carbon films | Bencherki Mebarki, Bok Hoen Kim, Deenesh Padhi, Pramit Manna, Christopher Dennis Bencher +4 more | 2016-05-10 |
| 8357618 | Frequency doubling using a photo-resist template mask | Christopher Dennis Bencher, Huixiong Dai, Hao Chen | 2013-01-22 |
| 8349741 | Amorphous carbon deposition method for improved stack defectivity | Hang Yu, Deenesh Padhi, Man-Ping Cai, Naomi Yoshida, Siu F. Cheng +4 more | 2013-01-08 |
| 8227352 | Amorphous carbon deposition method for improved stack defectivity | Hang Yu, Deenesh Padhi, Man-Ping Cai, Naomi Yoshida, Siu F. Cheng +4 more | 2012-07-24 |
| 8148269 | Boron nitride and boron-nitride derived materials deposition method | Mihaela Balseanu, Christopher Dennis Bencher, Yongmei Chen, Victor Nguyen, Isabelita Roflox +2 more | 2012-04-03 |
| 8084310 | Self-aligned multi-patterning for advanced critical dimension contacts | Bencherki Mebarki, Christopher Dennis Bencher, Jen Shu | 2011-12-27 |
| 7972959 | Self aligned double patterning flow with non-sacrificial features | Bencherki Mebarki, Kenlin Huang | 2011-07-05 |