| 11881321 |
Device for measuring total gas content of primary circuit of PWR nuclear power |
Dong Chen, Tao Hou, Xudong Wu, Gaoyong Liu |
2024-01-23 |
| 10014174 |
Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning |
Bencherki Mebarki, Pramit Manna, Deenesh Padhi, Bok Hoen Kim, Christopher Dennis Bencher |
2018-07-03 |
| 9659771 |
Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning |
Bencherki Mebarki, Pramit Manna, Deenesh Padhi, Bok Hoen Kim, Christopher Dennis Bencher |
2017-05-23 |
| 9337051 |
Method for critical dimension reduction using conformal carbon films |
Bencherki Mebarki, Bok Hoen Kim, Deenesh Padhi, Pramit Manna, Christopher Dennis Bencher +4 more |
2016-05-10 |
| 8357618 |
Frequency doubling using a photo-resist template mask |
Christopher Dennis Bencher, Huixiong Dai, Hao Chen |
2013-01-22 |
| 8349741 |
Amorphous carbon deposition method for improved stack defectivity |
Hang Yu, Deenesh Padhi, Man-Ping Cai, Naomi Yoshida, Siu F. Cheng +4 more |
2013-01-08 |
| 8227352 |
Amorphous carbon deposition method for improved stack defectivity |
Hang Yu, Deenesh Padhi, Man-Ping Cai, Naomi Yoshida, Siu F. Cheng +4 more |
2012-07-24 |
| 8148269 |
Boron nitride and boron-nitride derived materials deposition method |
Mihaela Balseanu, Christopher Dennis Bencher, Yongmei Chen, Victor Nguyen, Isabelita Roflox +2 more |
2012-04-03 |
| 8084310 |
Self-aligned multi-patterning for advanced critical dimension contacts |
Bencherki Mebarki, Christopher Dennis Bencher, Jen Shu |
2011-12-27 |
| 7972959 |
Self aligned double patterning flow with non-sacrificial features |
Bencherki Mebarki, Kenlin Huang |
2011-07-05 |