Issued Patents All Time
Showing 25 most recent of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372874 | System architecture of manufacturing of semiconductor wafers | Dmitry Lubomirsky, Ellie Yieh | 2025-07-29 |
| 12204246 | Metal oxide resist patterning with electrical field guided post-exposure bake | Mangesh Ashok BANGAR, Srinivas D. Nemani, Steven Hiloong WELCH, Ellie Yieh, Dmitry Lubomirsky | 2025-01-21 |
| 12198985 | Contact over active gate structure | Wenhui Wang, Christopher S. Ngai | 2025-01-14 |
| 12201030 | Spin-orbit torque MRAM structure and manufacture thereof | Minrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel +5 more | 2025-01-14 |
| 12085858 | Photoresist patterning process | Srinivas D. Nemani, Steven Hiloong WELCH, Mangesh Ashok BANGAR, Ellie Yieh | 2024-09-10 |
| 11914299 | Lithography process window enhancement for photoresist patterning | Mangesh Ashok BANGAR, Srinivas D. Nemani, Christopher S. Ngai, Ellie Yieh | 2024-02-27 |
| 11908691 | Techniques to engineer nanoscale patterned features using ions | Simon Ruffell, John Hautala, Adam Brand | 2024-02-20 |
| 11880137 | Film structure for electric field guided photoresist patterning process | Mangesh Ashok BANGAR, Srinivas D. Nemani, Ellie Yieh, Steven Hiloong WELCH, Christopher S. Ngai | 2024-01-23 |
| 11723283 | Spin-orbit torque MRAM structure and manufacture thereof | Minrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel +5 more | 2023-08-08 |
| 11650506 | Film structure for electric field guided photoresist patterning process | Mangesh Ashok BANGAR, Christopher S. Ngai, Srinivas D. Nemani, Ellie Yieh, Steven Hiloong WELCH | 2023-05-16 |
| 11609505 | Apparatus and methods for verification and re-use of process fluids | Mangesh Ashok BANGAR, Gautam Pisharody, Lancelot HUANG, Alan Tso, Douglas A. Buchberger, Jr. +3 more | 2023-03-21 |
| 11488823 | Techniques to engineer nanoscale patterned features using ions | Simon Ruffell, John Hautala, Adam Brand | 2022-11-01 |
| 11437284 | Contact over active gate structure | Wenhui Wang, Christopher S. Ngai | 2022-09-06 |
| 11429026 | Lithography process window enhancement for photoresist patterning | Mangesh Ashok BANGAR, Srinivas D. Nemani, Christopher S. Ngai, Ellie Yieh | 2022-08-30 |
| 11313034 | Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition | Weimin Zeng, Yong Cao, Daniel Lee Diehl, Khoi A. Phan, Christopher S. Ngai +2 more | 2022-04-26 |
| 11043380 | Techniques to engineer nanoscale patterned features using ions | Simon Ruffell, John Hautala, Adam Brand | 2021-06-22 |
| 10990014 | Performance improvement of EUV photoresist by ion implantation | Tristan Y. Ma, Anthony Renau, John Hautala, Joseph C. Olson | 2021-04-27 |
| 10957590 | Method for forming a layer | Wenhui Wang, Christopher S. Ngai, Liqi Wu, Wenyu Zhang, Yongmei Chen +3 more | 2021-03-23 |
| 10927451 | Methods and apparatus for patterning substrates using asymmetric physical vapor deposition | Bencherki Mebarki, Byeong-Chan Lee, Tejinder Singh, Joung Joo Lee, Xianmin Tang | 2021-02-23 |
| 10927450 | Methods and apparatus for patterning substrates using asymmetric physical vapor deposition | Bencherki Mebarki, Wenhui Wang, Christopher S. Ngai, Joung Joo Lee, Xianmin Tang | 2021-02-23 |
| 10930555 | Contact over active gate structure | Wenhui Wang, Christopher S. Ngai | 2021-02-23 |
| 10930556 | Contact over active gate structure | Wenhui Wang, Christopher S. Ngai | 2021-02-23 |
| 10825665 | Directional treatment for multi-dimensional device processing | Ludovic Godet, Srinivas D. Nemani, Ellie Yieh, Nitin K. Ingle | 2020-11-03 |
| 10643895 | Self-aligned interconnects formed using subtractive techniques | Bencherki Mebarki, Yongmei Chen, He Ren, Mehul Naik | 2020-05-05 |
| 10545408 | Performance improvement of EUV photoresist by ion implantation | Tristan Y. Ma, Anthony Renau, John Hautala, Joseph C. Olson | 2020-01-28 |