| 12431361 |
Self-aligned double patterning with spatial atomic layer deposition |
Ning Li, Mihaela Balseanu, Li-Qun Xia, Keiichi Tanaka, Steven Marcus |
2025-09-30 |
| 11164753 |
Self-aligned double patterning with spatial atomic layer deposition |
Ning Li, Mihaela Balseanu, Li-Qun Xia, Keiichi Tanaka, Steven Marcus |
2021-11-02 |
| 11028478 |
Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors |
Ning Li, Mihaela Balseanu, Li-Qun Xia, Mark Saly, David Thompson |
2021-06-08 |
| 10170298 |
High temperature silicon oxide atomic layer deposition technology |
Wenbo Yan, Cong Trinh, Ning Li, Mihaela Balseanu, Li-Qun Xia +1 more |
2019-01-01 |
| 10023958 |
Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors |
Ning Li, Mihaela Balseanu, Li-Qun Xia, Mark Saly, David Thompson |
2018-07-17 |
| 9984868 |
PEALD of films comprising silicon nitride |
Woong Jae Lee, Mihaela Balseanu, Li-Qun Xia, Derek R. Witty |
2018-05-29 |
| 9875888 |
High temperature silicon oxide atomic layer deposition technology |
Wenbo Yan, Cong Trinh, Ning Li, Mihaela Balseanu, Li-Qun Xia +1 more |
2018-01-23 |
| 9297073 |
Accurate film thickness control in gap-fill technology |
Ning Li, Wenbo Yan, Cong Trinh, Mihaela Balseanu, Li-Qun Xia |
2016-03-29 |
| 8758638 |
Copper oxide removal techniques |
Weifeng YE, Mei-Yee Shek, Mihaela Balseanu, Li-Qun Xia, Derek R. Witty |
2014-06-24 |
| 8598020 |
Plasma-enhanced chemical vapor deposition of crystalline germanium |
Mihaela Balseanu, Li-Qun Xia, Derek R. Witty |
2013-12-03 |
| 8586487 |
Low temperature plasma enhanced chemical vapor deposition of conformal silicon carbon nitride and silicon nitride films |
Mihaela Balseanu, Li-Qun Xia, Derek R. Witty |
2013-11-19 |
| 8337950 |
Method for depositing boron-rich films for lithographic mask applications |
Yi-Hsing Chen, Mihaela Balseanu, Isabelita Roflox, Li-Qun Xia, Derek R. Witty |
2012-12-25 |
| 8148269 |
Boron nitride and boron-nitride derived materials deposition method |
Mihaela Balseanu, Christopher Dennis Bencher, Yongmei Chen, Li Yan Miao, Isabelita Roflox +2 more |
2012-04-03 |
| 8138104 |
Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cure |
Mihaela Balseanu, Li-Qun Xia, Derek R. Witty, Hichem M'Saad, Mei-Yee Shek +1 more |
2012-03-20 |
| 8084105 |
Method of depositing boron nitride and boron nitride-derived materials |
Jeong-Uk Huh, Mihaela Balseanu, Li-Qun Xia, Derek R. Witty, Hichem M'Saad |
2011-12-27 |
| 7871926 |
Methods and systems for forming at least one dielectric layer |
Li-Qun Xia, Mihaela Balseanu, Derek R. Witty, Hichem M'Saad, Haichun Yang +3 more |
2011-01-18 |
| 7790635 |
Method to increase the compressive stress of PECVD dielectric films |
Mihaela Balseanu, Li-Qun Xia, Vladimir Zubkov, Derek R. Witty, Hichem M'Saad |
2010-09-07 |
| 7407896 |
CMOS-compatible light emitting aperiodic photonic structures |
Luca Dal Negro, Jae Hyung Yi, Jurgen Michel, Yasha Yi, Lionel C. Kimerling |
2008-08-05 |
| 7120335 |
Vertically and laterally confined 3D optical coupler |
Anuradha M. Agarwal, Lionel C. Kimerling, Hermann A. Haus, Kazumi Wada, Steven G. Johnson +2 more |
2006-10-10 |
