Issued Patents All Time
Showing 25 most recent of 105 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12415824 | Molybdenum(0) precursors for deposition of molybdenum films | Chandan Kr Barik, John Sudijono, Chandan Das, Doreen Wei Ying Yong, Bhaskar Jyoti Bhuyan +1 more | 2025-09-16 |
| 12394620 | Benzyl compound passivation for selective deposition and selective etch protection | Feng Q. Liu, David Thompson | 2025-08-19 |
| 12338547 | Method for forming silicon-phosphorous materials | Errol Antonio C. Sanchez, Schubert S. Chu, Abhishek Dube, Srividya Natarajan | 2025-06-24 |
| 12334394 | Methods and apparatus for selective etch stop capping and selective via open for fully landed via on underlying metal | Suketu Arun Parikh, Mihaela Balseanu, Bhaskar Jyoti Bhuyan, Ning Li, Aaron Dangerfield +2 more | 2025-06-17 |
| 12315733 | Enhanced etch selectivity using halides | David Knapp, Feng Qiao, Hailong Zhou, Junkai He, Qian Fu +2 more | 2025-05-27 |
| 12305275 | Corrosion resistant film on a chamber component and methods of depositing thereof | Lisa J. Enman, Steven Marcus, Lei Zhou | 2025-05-20 |
| 12300491 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan, Regina Freed +3 more | 2025-05-13 |
| 12300503 | Etching of metal oxides using fluorine and metal halides | Keenan N. Woods, Zhenjiang Cui | 2025-05-13 |
| 12291779 | Methods of selective atomic layer deposition | Bhaskar Jyoti Bhuyan, David Thompson, Tobin Kaufman-Osborn, Kurt Fredrickson, Thomas Knisley +1 more | 2025-05-06 |
| 12281387 | Method of depositing metal films | Feng Q. Liu, David Thompson, Annamalai Lakshmanan, Avgerinos V. Gelatos, Joung Joo Lee | 2025-04-22 |
| 12282256 | Photoresist deposition using independent multichannel showerhead | Farzad Houshmand, Wayne French, Anantha K. Subramani, Kelvin Chan, Lakmal C. Kalutarage | 2025-04-22 |
| 12281382 | Methods for depositing blocking layers on conductive surfaces | Lakmal C. Kalutarage, Bhaskar Jyoti Bhuyan, Aaron Dangerfield, Feng Q. Liu, Michael Haverty +1 more | 2025-04-22 |
| 12272551 | Selective metal removal with flowable polymer | Liqi Wu, Feng Q. Liu, Bhaskar Jyoti Bhuyan, James Hugh Connolly, Zhimin QI +7 more | 2025-04-08 |
| 12261049 | Selective etch of a substrate | David Thompson, Bhaskar Jyoti Bhuyan, Lisa J. Enman, Aaron Dangerfield, Jesus Candelario Mendoza +2 more | 2025-03-25 |
| 12131900 | Methods for depositing blocking layers on metal surfaces | Bhaskar Jyoti Bhuyan, Lakmal C. Kalutarage, Thomas Knisley | 2024-10-29 |
| 12110584 | Low temperature growth of transition metal chalcogenides | Chandan Das, Susmit Singha Roy, Bhaskar Jyoti Bhuyan, John Sudijono, Abhijit Basu Mallick | 2024-10-08 |
| 12094766 | Selective blocking of metal surfaces using bifunctional self-assembled monolayers | Michael L. McSwiney, Bhaskar Jyoti Bhuyan, Drew Phillips, Aaron Dangerfield, David Thompson +2 more | 2024-09-17 |
| 12084764 | Vapor phase photoresists deposition | Lakmal C. Kalutarage, Aaron Dangerfield, David Thompson, Susmit Singha Roy, Regina Freed | 2024-09-10 |
| 12084464 | Rhenium complexes and methods of use | Thomas Knisley, Keenan N. Woods, Charles H. Winter, Stefan Cwik | 2024-09-10 |
| 12068170 | Vapor phase thermal etch solutions for metal oxo photoresists | Lakmal C. Kalutarage, Bhaskar Jyoti Bhuyan, Madhur Sachan, Regina Freed | 2024-08-20 |
| 12060370 | Molybdenum (0) precursors for deposition of molybdenum films | Andrea Leoncini, Paul Mehlmann, Nemanja Dordevic, Han Vinh Huynh, Doreen Wei Ying Yong +1 more | 2024-08-13 |
| 12040427 | Preclean and encapsulation of microLED features | Thomas Knisley, Bhaskar Jyoti Bhuyan, Mingwei Zhu | 2024-07-16 |
| 12033866 | Vapor phase thermal etch solutions for metal oxo photoresists | Lakmal C. Kalutarage, Bhaskar Jyoti Bhuyan, Madhur Sachan, Regina Freed | 2024-07-09 |
| 12031209 | Reducing agents for atomic layer deposition | Bhaskar Jyoti Bhuyan, Lakmal C. Kalutarage, Thomas Knisley | 2024-07-09 |
| 12018363 | Gap-fill with aluminum-containing films | Lakmal C. Kalutarage, Jeffrey W. Anthis, Tatsuya Sato | 2024-06-25 |