MS

Madhur Sachan

Applied Materials: 10 patents #1,290 of 7,310Top 20%
MI Micromaterials: 4 patents #9 of 34Top 30%
Overall (All Time): #333,663 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12416863 Dry develop process of photoresist Yuqiong Dai, Regina Freed, Hoyung David Hwang 2025-09-16
12300491 Deposition of semiconductor integration films Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more 2025-05-13
12068170 Vapor phase thermal etch solutions for metal oxo photoresists Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Regina Freed 2024-08-20
12033866 Vapor phase thermal etch solutions for metal oxo photoresists Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Regina Freed 2024-07-09
11886120 Deposition of semiconductor integration films Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more 2024-01-30
11881402 Self aligned multiple patterning Lili Feng, Regina Freed 2024-01-23
11869807 Fully self-aligned subtractive etch Lili Feng, Yuqiong Dai, Regina Freed, Ho-yung David Hwang 2024-01-09
11621172 Vapor phase thermal etch solutions for metal oxo photoresists Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Regina Freed 2023-04-04
11562904 Deposition of semiconductor integration films Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more 2023-01-24
11437273 Self-aligned contact and contact over active gate structures Yuriy Shusterman, Susmit Singha Roy, Regina Freed, Sanjay Natarajan 2022-09-06
11437274 Fully self-aligned via Regina Freed, Susmit Singha Roy, Gabriela Alva, Ho-yung David Hwang, Uday Mitra +4 more 2022-09-06
11133152 Methods and apparatus for performing profile metrology on semiconductor structures Regina Freed, Russell Chin Yee Teo 2021-09-28
11037825 Selective removal process to create high aspect ratio fully self-aligned via Amrita B. Mullick, He Ren, Swaminathan Srinivasan, Regina Freed, Uday Mitra 2021-06-15
10790191 Selective removal process to create high aspect ratio fully self-aligned via Amrita B. Mullick, He Ren, Swaminathan Srinivasan, Regina Freed, Uday Mitra 2020-09-29