Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12416863 | Dry develop process of photoresist | Yuqiong Dai, Regina Freed, Hoyung David Hwang | 2025-09-16 |
| 12300491 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more | 2025-05-13 |
| 12068170 | Vapor phase thermal etch solutions for metal oxo photoresists | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Regina Freed | 2024-08-20 |
| 12033866 | Vapor phase thermal etch solutions for metal oxo photoresists | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Regina Freed | 2024-07-09 |
| 11886120 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more | 2024-01-30 |
| 11881402 | Self aligned multiple patterning | Lili Feng, Regina Freed | 2024-01-23 |
| 11869807 | Fully self-aligned subtractive etch | Lili Feng, Yuqiong Dai, Regina Freed, Ho-yung David Hwang | 2024-01-09 |
| 11621172 | Vapor phase thermal etch solutions for metal oxo photoresists | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Regina Freed | 2023-04-04 |
| 11562904 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more | 2023-01-24 |
| 11437273 | Self-aligned contact and contact over active gate structures | Yuriy Shusterman, Susmit Singha Roy, Regina Freed, Sanjay Natarajan | 2022-09-06 |
| 11437274 | Fully self-aligned via | Regina Freed, Susmit Singha Roy, Gabriela Alva, Ho-yung David Hwang, Uday Mitra +4 more | 2022-09-06 |
| 11133152 | Methods and apparatus for performing profile metrology on semiconductor structures | Regina Freed, Russell Chin Yee Teo | 2021-09-28 |
| 11037825 | Selective removal process to create high aspect ratio fully self-aligned via | Amrita B. Mullick, He Ren, Swaminathan Srinivasan, Regina Freed, Uday Mitra | 2021-06-15 |
| 10790191 | Selective removal process to create high aspect ratio fully self-aligned via | Amrita B. Mullick, He Ren, Swaminathan Srinivasan, Regina Freed, Uday Mitra | 2020-09-29 |