HH

Ho-yung David Hwang

Applied Materials: 16 patents #838 of 7,310Top 15%
TSMC: 15 patents #2,074 of 12,232Top 20%
MI Micromaterials: 10 patents #3 of 34Top 9%
📍 Cupertino, CA: #340 of 6,989 inventorsTop 5%
🗺 California: #10,163 of 386,348 inventorsTop 3%
Overall (All Time): #68,720 of 4,157,543Top 2%
43
Patents All Time

Issued Patents All Time

Showing 1–25 of 43 patents

Patent #TitleCo-InventorsDate
12387927 Deposition of boron films Yung-Chen Lin, Chi-I Lang 2025-08-12
12327764 Two-dimension self-aligned scheme with subtractive metal etch Yung-Chen Lin, Chi-I Lang 2025-06-10
12272564 Tin oxide and tin carbide materials for semiconductor patterning applications Yung-Chen Lin, Chi-I Lang 2025-04-08
12196491 Adaptive baking method Tzung-Chen Wu, Heng-Jen Lee, Wen-Zhan Zhou 2025-01-14
12025917 System and method for supplying and dispensing bubble-free photolithography chemical solutions Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu +1 more 2024-07-02
12020908 Atomic layer etching of Ru metal Yung-Chen Lin, Chi-I Lang 2024-06-25
11994800 Dose reduction of patterned metal oxide photoresists Tejinder Singh, Lifan Yan, Abhijit Basu Mallick, Daniel Lee Diehl, Jothilingam Ramalingam 2024-05-28
11869807 Fully self-aligned subtractive etch Lili Feng, Yuqiong Dai, Madhur Sachan, Regina Freed 2024-01-09
11638374 Multicolor approach to DRAM STI active cut patterning Tejinder Singh, Takehito Koshizawa, Abhijit Basu Mallick, Pramit Manna, Nancy Fung +2 more 2023-04-25
11550222 Dose reduction of patterned metal oxide photoresists Tejinder Singh, Lifan Yan, Abhijit Basu Mallick, Daniel Lee Diehl, Jothilingam Ramalingam 2023-01-10
11508617 Method of forming interconnect for semiconductor device Hao Jiang, Chi-Pin Lu, He Ren, Chi-I Lang, Mehul Naik 2022-11-22
11508618 Multicolor self-aligned contact selective etch Yung-Chen Lin, Qingjun Zhou, Ying Zhang 2022-11-22
11437274 Fully self-aligned via Regina Freed, Madhur Sachan, Susmit Singha Roy, Gabriela Alva, Uday Mitra +4 more 2022-09-06
11437238 Patterning scheme to improve EUV resist and hard mask selectivity Nancy Fung, Chi-I Lang 2022-09-06
11335690 Multicolor approach to DRAM STI active cut patterning Tejinder Singh, Takehito Koshizawa, Abhijit Basu Mallick, Pramit Manna, Nancy Fung +2 more 2022-05-17
11204200 Adaptive baking method Tzung-Chen Wu, Wen-Zhan Zhou, Heng-Jen Lee 2021-12-21
11164938 DRAM capacitor module Uday Mitra, Regina Freed, Sanjay Natarajan, Lequn Liu 2021-11-02
11139205 Self-aligned subtractive interconnect patterning Lei Zhong 2021-10-05
11094589 Multicolor self-aligned contact selective etch Yung-Chen Lin, Qingjun Zhou, Ying Zhang 2021-08-17
10910381 Multicolor approach to DRAM STI active cut patterning Tejinder Singh, Takehito Koshizawa, Abhijit Basu Mallick, Pramit Manna, Nancy Fung +2 more 2021-02-02
10840138 Selectively etched self-aligned via processes Yung-Chen Lin, Qingjun Zhou, Ying Zhang 2020-11-17
10699953 Method for creating a fully self-aligned via Amrita B. Mullick, Nitin K. Ingle, Xikun Wang, Regina Freed, Uday Mitra 2020-06-30
10600688 Methods of producing self-aligned vias Ying Zhang, Regina Freed, Nitin K. Ingle, Uday Mitra 2020-03-24
10593594 Selectively etched self-aligned via processes Yung-Chen Lin, Qingjun Zhou, Ying Zhang, Uday Mitra, Regina Freed 2020-03-17
10573555 Methods of producing self-aligned grown via Ying Zhang, Regina Freed, Nitin K. Ingle, Uday Mitra, Abhijit Basu Mallick 2020-02-25