Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12196491 | Adaptive baking method | Tzung-Chen Wu, Ho-yung David Hwang, Wen-Zhan Zhou | 2025-01-14 |
| 12025917 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Wen-Zhan Zhou, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang +1 more | 2024-07-02 |
| 11204200 | Adaptive baking method | Tzung-Chen Wu, Wen-Zhan Zhou, Ho-yung David Hwang | 2021-12-21 |
| 10558120 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Wen-Zhan Zhou, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang +1 more | 2020-02-11 |
| 10274839 | Two-dimensional marks | Wen-Zhan Zhou, Chen-Ming Wang, Kai-Hsiung Cheng, Chih-Ming Ke, Ho-yung David Hwang | 2019-04-30 |
| 10006717 | Adaptive baking system and method of using the same | Tzung-Chen Wu, Wen-Zhan Zhou, Ho-yung David Hwang | 2018-06-26 |
| 9817315 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Wen-Zhan Zhou, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang +1 more | 2017-11-14 |
| 9690212 | Hybrid focus-exposure matrix | Wen-Zhan Zhou, Yen-Liang Chen, Kai-Hsiung Chen, Chih-Ming Ke, Ho-yung David Hwang | 2017-06-27 |
| 9671685 | Lithographic plane check for mask processing | Chin-Hsiang Lin, I-Hsiung Huang, Chih-Chiang Tu, Chun-Jen Chen, Rick Lai | 2017-06-06 |
| 9632426 | In-situ immersion hood cleaning | Jui-Chun Peng | 2017-04-25 |
| 9601324 | Method of making wafer assembly | I-Hsiung Huang, Heng-Hsin Liu, Chin-Hsiang Lin | 2017-03-21 |
| 9196515 | Litho cluster and modulization to enhance productivity | I-Hsiung Huang, Heng-Hsin Liu, Chin-Hsiang Lin | 2015-11-24 |
| 9111982 | Wafer assembly with carrier wafer | I-Hsiung Huang, Heng-Hsin Liu, Chin-Hsiang Lin | 2015-08-18 |
| 8955530 | System and method for cleaning a wafer chuck | Jui-Chun Peng | 2015-02-17 |
| 8906599 | Enhanced scanner throughput system and method | Yu-Mei Liu, Chin-Hsiang Lin, Heng-Hsin Liu, I-Hsiung Huang, Chih-Wei Lin | 2014-12-09 |
| 8903532 | Litho cluster and modulization to enhance productivity | I-Hsiung Huang, Heng-Hsin Liu, Chin-Hsiang Lin | 2014-12-02 |
| 8860941 | Tool induced shift reduction determination for overlay metrology | Yung-Yao Lee, Ying-Ying Wang, Heng-Hsin Liu | 2014-10-14 |
| 8848163 | Photoresist materials and photolithography processes | Hsien-Cheng Wang, Chin-Hsiang Lin, Ching-Yu Chang, Hua-Tai Lin, Burn Jeng Lin | 2014-09-30 |
| 8625076 | Wafer edge exposure module | Tsung-Chih Chien, Yung-Cheng Chen | 2014-01-07 |
| 8609545 | Method to improve mask critical dimension uniformity (CDU) | I-Hsiung Huang, Chi-Lin Lu, Sheng-Chi Chin, Yao-Ching Ku | 2013-12-17 |
| 8592102 | Cost-effective method for extreme ultraviolet (EUV) mask production | Chin-Hsiang Lin, I-Hsiung Huang, Chih-Chiang Tu, Chun-Jen Chen, Rick Lai | 2013-11-26 |
| 8544317 | Semiconductor processing apparatus with simultaneously movable stages | Yu-Fu Lin, Yung-Cheng Chen, Chin-Hsiang Lin | 2013-10-01 |
| 8507177 | Photoresist materials and photolithography processes | Hsien-Cheng Wang, Chin-Hsiang Lin, Ching-Yu Chang, Hua-Tai Lin, Burn Jeng Lin | 2013-08-13 |
| 8338262 | Dual wavelength exposure method and system for semiconductor device manufacturing | Jui-Chun Peng, I-Hsiung Huang | 2012-12-25 |
| 8237132 | Method and apparatus for reducing down time of a lithography system | Jui-Chun Peng, Tung-Li Wu, I-Hsiung Huang | 2012-08-07 |