Issued Patents All Time
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429783 | EUV lithography apparatus and operating method for mitigating contamination | Yung-Cheng Chen, Tung-Li Wu | 2025-09-30 |
| 12276906 | Methods for cleaning lithography mask | Yung-Cheng Chen, Chi-Lun Lu | 2025-04-15 |
| 10996498 | Display apparatus with touch sensing and force sensing functions | Yi-San Hsieh, Shih-Lun Lai, Wen-Chang Hsieh | 2021-05-04 |
| 10712864 | Dual-mode capacitive touch display panel | Shih-Lun Lai, Yi-San Hsieh | 2020-07-14 |
| 10416804 | Dual-mode capacitive touch display panel | Shih-Lun Lai, Yi-San Hsieh | 2019-09-17 |
| 9671685 | Lithographic plane check for mask processing | Chin-Hsiang Lin, Heng-Jen Lee, Chih-Chiang Tu, Chun-Jen Chen, Rick Lai | 2017-06-06 |
| 9601324 | Method of making wafer assembly | Heng-Hsin Liu, Heng-Jen Lee, Chin-Hsiang Lin | 2017-03-21 |
| 9196515 | Litho cluster and modulization to enhance productivity | Heng-Hsin Liu, Heng-Jen Lee, Chin-Hsiang Lin | 2015-11-24 |
| 9128320 | Three-dimensional display and three dimensional display system | Wen-Lung Chen, Chih-Jen Hu, Yue-Shih Jeng, Po-Wei Wu, Yu-June Wu +2 more | 2015-09-08 |
| 9111982 | Wafer assembly with carrier wafer | Heng-Hsin Liu, Heng-Jen Lee, Chin-Hsiang Lin | 2015-08-18 |
| 9025092 | Liquid crystal display comprising liquid crystal lens driven at a first time period and a second time period | Po-Wei Wu, Ming-Fang Chien | 2015-05-05 |
| 8906599 | Enhanced scanner throughput system and method | Yu-Mei Liu, Chin-Hsiang Lin, Heng-Hsin Liu, Heng-Jen Lee, Chih-Wei Lin | 2014-12-09 |
| 8903532 | Litho cluster and modulization to enhance productivity | Heng-Hsin Liu, Heng-Jen Lee, Chin-Hsiang Lin | 2014-12-02 |
| 8609545 | Method to improve mask critical dimension uniformity (CDU) | Chi-Lin Lu, Heng-Jen Lee, Sheng-Chi Chin, Yao-Ching Ku | 2013-12-17 |
| 8592102 | Cost-effective method for extreme ultraviolet (EUV) mask production | Chin-Hsiang Lin, Heng-Jen Lee, Chih-Chiang Tu, Chun-Jen Chen, Rick Lai | 2013-11-26 |
| 8592287 | Overlay alignment mark and method of detecting overlay alignment error using the mark | Chi-Yuan Shih, Heng-Hsin Liu | 2013-11-26 |
| 8338262 | Dual wavelength exposure method and system for semiconductor device manufacturing | Heng-Jen Lee, Jui-Chun Peng | 2012-12-25 |
| 8338960 | Method of manufacturing photomask and method of repairing optical proximity correction | Ling-Chieh Lin, Chien-Fu Lee | 2012-12-25 |
| 8278762 | Method of manufacturing photomask and method of repairing optical proximity correction | Ling-Chieh Lin, Chien-Fu Lee | 2012-10-02 |
| 8237132 | Method and apparatus for reducing down time of a lithography system | Jui-Chun Peng, Heng-Jen Lee, Tung-Li Wu | 2012-08-07 |
| 8101530 | Lithography patterning method | Chin-Hsiang Lin, Heng-Jen Lee, Heng-Hsin Liu | 2012-01-24 |
| 7617475 | Method of manufacturing photomask and method of repairing optical proximity correction | Ling-Chieh Lin, Chien-Fu Lee | 2009-11-10 |
| 6839126 | Photolithography process with multiple exposures | Yeong-Song Yen, Jiunn-Ren Hwang, Kuei-Chun Hung, Ching-Hsu Chang | 2005-01-04 |
| 6680163 | Method of forming opening in wafer layer | Jiunn-Ren Hwang | 2004-01-20 |
| 6664028 | Method of forming opening in wafer layer | Jiunn-Ren Hwang | 2003-12-16 |