Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6656667 | Multiple resist layer photolithographic process | Jiunn-Ren Hwang | 2003-12-02 |
| 6589881 | Method of forming dual damascene structure | Jiunn-Ren Hwang, Kuei-Chun Hung, Ching-Hsu Chang | 2003-07-08 |
| 6582858 | Alternating phase shifting mask | Chien-Wen Lai, Chien-Ming Wang, Feng-Yuan Chang | 2003-06-24 |
| 6579790 | Dual damascene manufacturing process | Jiunn-Ren Hwang | 2003-06-17 |
| 6541782 | Electron beam photolithographic process | Jiunn-Ren Hwang | 2003-04-01 |
| 6492097 | Process for increasing a line width window in a semiconductor process | Anseime Chen, Chieh-Ming Wang | 2002-12-10 |
| 6489085 | Thermal reflow photolithographic process | Anderson Chang, Chien-Wen Lai, Anseime Chen | 2002-12-03 |
| 6458705 | Method for forming via-first dual damascene interconnect structure | Kuei-Chun Hung, Vencent Chang, Ya Hui Chang | 2002-10-01 |
| 6444410 | Method of improving photoresist profile | Anseime Chen, Chieh-Ming Wang | 2002-09-03 |
| 6391757 | Dual damascene process | Jiunn-Ren Hwang, Yeong-Song Yen, Ching-Hsu Chang | 2002-05-21 |
| 6380077 | Method of forming contact opening | Jiunn-Ren Hwang | 2002-04-30 |
| 6350681 | Method of forming dual damascene structure | Anseime Chen, Chingfu Lin, Yi-Fang Cheng | 2002-02-26 |
| 6337269 | Method of fabricating a dual damascene structure | Jiunn-Ren Hwang, Kuei-Chun Hung | 2002-01-08 |
| 6316340 | Photolithographic process for preventing corner rounding | Jiunn-Ren Hwang | 2001-11-13 |
| 6312855 | Three-phase phase shift mask | Jiunn-Ren Hwang, Anseime Chen | 2001-11-06 |
| 6080527 | Optical proximity correction of L and T shaped patterns on negative photoresist | Anseime Chen, Jiunn-Ren Huang | 2000-06-27 |