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USPTO Patent Rankings Data through Dec 31, 2025
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Anseime Chen — 10 Patents

UMUnited Microelectronics: 10 patents #574 of 4,560Top 15%
Hsinchu, TW: #2,311 of 13,380 inventorsTop 20%
Overall (All Time): #481,000 of 4,157,543Top 15%
10 Patents All Time
Anseime Chen has been granted 10 US patents while listed as an inventor at United Microelectronics. The first was granted in 2000 and the most recent in January 2004. Anseime Chen ranks #481,000 of 4,157,543 US inventors in our database (top 11.6%). Patent records list Anseime Chen in Hsinchu, TW.

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
6680252 Method for planarizing barc layer in dual damascene process Hui Huang, Vencent Chang, Andersen Chang 2004-01-20 $2,563,000
6492097 Process for increasing a line width window in a semiconductor process Chieh-Ming Wang, I-Hsiung Huang 2002-12-10 $940,000
6489085 Thermal reflow photolithographic process I-Hsiung Huang, Anderson Chang, Chien-Wen Lai 2002-12-03 $875,000
6444410 Method of improving photoresist profile I-Hsiung Huang, Chieh-Ming Wang 2002-09-03 $2,156,000
6420791 Alignment mark design Chien-Chao Huang, Shih-Che Wang 2002-07-16 $3,161,000
6417096 Method for avoiding photo residue in dual damascene with acid treatment Jun Maeda, Sheng-Yueh Chang, Sung-Hsiung Wang 2002-07-09 $2,404,000
6350681 Method of forming dual damascene structure Chingfu Lin, Yi-Fang Cheng, I-Hsiung Huang 2002-02-26 $844,000
6323123 Low-K dual damascene integration process Chih-Chien Liu, Cheng-Yuan Tsai, Ming-Sheng Yang 2001-11-27 $1,246,000
6312855 Three-phase phase shift mask Jiunn-Ren Hwang, I-Hsiung Huang 2001-11-06 $1,264,000
6080527 Optical proximity correction of L and T shaped patterns on negative photoresist I-Hsiung Huang, Jiunn-Ren Huang 2000-06-27