SW

Sung-Hsiung Wang

TSMC: 6 patents #3,824 of 12,232Top 35%
UM United Microelectronics: 5 patents #1,074 of 4,560Top 25%
📍 Baoshan, TW: #340 of 3,661 inventorsTop 10%
Overall (All Time): #467,711 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
7968968 Inductor utilizing pad metal layer Chih-Ping Chao, Chia-Yu Su 2011-06-28
7297629 Ultra-thick metal-copper dual damascene process 2007-11-20
7229879 Metal-insulator-metal (MIM) capacitor structure formed with dual damascene structure 2007-06-12
7074721 Method for forming thick copper self-aligned dual damascene 2006-07-11
7038266 Metal-insulator-metal (MIM) capacitor structure formed with dual damascene structure 2006-05-02
6903644 Inductor device having improved quality factor Shuo-Mao Chen, Heng-Ming Hsu, Jui-Feng Kuan, Chih-Ping Chao, Chih-Hsien Lin 2005-06-07
6617234 Method of forming metal fuse and bonding pad Yimin Huang, Chiung-Sheng Hsiung 2003-09-09
6583489 Method for forming interconnect structure with low dielectric constant Yi-Min Huang, Gwo-Shii Yang, Chiung-Sheng Hsiung, Hsueh-Chung Chen, Chih-Chien Liu 2003-06-24
6559004 Method for forming three dimensional semiconductor structure and three dimensional capacitor Gwo-Shii Yang, Hsueh-Chung Chen, Chiung-Sheng Hsiung, Tong-Yu Chen 2003-05-06
6417096 Method for avoiding photo residue in dual damascene with acid treatment Anseime Chen, Jun Maeda, Sheng-Yueh Chang 2002-07-09
6355568 Cleaning method for copper dual damascene process Chan-Lon Yang 2002-03-12