SC

Sheng-Yueh Chang

EI Everlight Chemical Industrial: 4 patents #1 of 47Top 3%
IT ITRI: 4 patents #1,876 of 9,619Top 20%
UM United Microelectronics: 1 patents #2,686 of 4,560Top 60%
Overall (All Time): #879,976 of 4,157,543Top 25%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
6573024 Ammonium salt of organic acid and resist composition containing the same Jian-Hong Chen, Ting-Chun Liu, Tzu-Yu Lin, Wen-Yuang Tsai 2003-06-03
6538086 Polymer with a pericyclic protective group and resist composition containing the same Bang-Chein Ho, Jui-Fa Chang, Jian-Hong Chen, Ming-Chia Tai 2003-03-25
6417096 Method for avoiding photo residue in dual damascene with acid treatment Anseime Chen, Jun Maeda, Sung-Hsiung Wang 2002-07-09
6303725 Cyclic dione polymer Bang-Chein Ho, Jian-Hong Chen, Ting-Chun Liu, Tzu-Yu Lin 2001-10-16
6207779 Ring-opened polymer Bang-Chein Ho, Jian-Hong Chen, Tai-Sheng Yeh, Jui-Fa Chang 2001-03-27
6197476 Photosensitive composition containing a cyclic dione polymer Bang-Chein Ho, Jian-Hong Chen, Ting-Chun Liu, Tzu-Yu Lin 2001-03-06