Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12362179 | Method and apparatus for coating photo resist over a substrate | Tung-Hung FENG, Hui-Chun LEE, Sheng Jiang | 2025-07-15 |
| 12025917 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu +1 more | 2024-07-02 |
| 12001132 | Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask | Pei-Cheng Hsu, Ta-Cheng Lien, Ping-Hsun Lin, Hsin-Chang Lee | 2024-06-04 |
| 11955335 | Method and apparatus for coating photo resist over a substrate | Tung-Hung FENG, Hui-Chun LEE, Sheng Jiang | 2024-04-09 |
| 11798800 | Method and apparatus for solvent recycling | Chun-Wei LIAO, Tung-Hung FENG, Hui-Chun LEE | 2023-10-24 |
| 11624985 | Methods of defect inspection | Ta-Ching Yu, Shu-Hao Chang, Yi-Hao Chen, Chen-Yen Kao, Te-Chih Huang +1 more | 2023-04-11 |
| 11545361 | Method and apparatus for coating photo resist over a substrate | Tung-Hung FENG, Hui-Chun LEE, Sheng Jiang | 2023-01-03 |
| 10795270 | Methods of defect inspection | Ta-Ching Yu, Shu-Hao Chang, Yi-Hao Chen, Chen-Yen Kao, Te-Chih Huang +1 more | 2020-10-06 |
| 10558120 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu +1 more | 2020-02-11 |
| 10274818 | Lithography patterning with sub-resolution assistant patterns and off-axis illumination | Hua-Tai Lin, Yu YANG, Wen-Ta Liang, Ching-Huang Chen, Chi-Yuan Sun | 2019-04-30 |
| 9817315 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu +1 more | 2017-11-14 |
| 9280041 | Cross quadrupole double lithography method using two complementary apertures | Hsien-Cheng Wang, Hung-Chang Hsieh, Ping-Chieh Wu, Wen-Chun Huang, Ming-Chang Wen | 2016-03-08 |
| 8416393 | Cross quadrupole double lithography method and apparatus for semiconductor device fabrication using two apertures | Hsien-Cheng Wang, Hung-Chang Hsieh, Ping-Chieh Wu, Wen-Chun Huang, Ming-Chang Wen | 2013-04-09 |
| 7838173 | Structure design and fabrication on photomask for contact hole manufacturing process window enhancement | Ya Hui Chang, Tsiao-Chen Wu | 2010-11-23 |
| 7338909 | Micro-etching method to replicate alignment marks for semiconductor wafer photolithography | Yu-Liang Lin, Henry Lo, Chung-Long Chang, Gorge Huang, Tony Lu +8 more | 2008-03-04 |
| 6420791 | Alignment mark design | Chien-Chao Huang, Anseime Chen | 2002-07-16 |
| 6080659 | Method to form an alignment mark | Chia-Chen Chen | 2000-06-27 |