Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12321100 | Semiconductor lithography system and/or method | Chi-Ming Yang, Hsu-Shui Liu | 2025-06-03 |
| 12038684 | Reflective mask and fabricating method thereof | Pei-Cheng Hsu | 2024-07-16 |
| 11921430 | Semiconductor lithography system and/or method | Chi-Ming Yang, Hsu-Shui Liu | 2024-03-05 |
| 11630386 | Reflective mask and fabricating method thereof | Pei-Cheng Hsu | 2023-04-18 |
| 11402761 | Semiconductor lithography system and/or method | Chi-Ming Yang, Hsu-Shui Liu | 2022-08-02 |
| 11243461 | Reflective mask and fabricating method thereof | Pei-Cheng Hsu | 2022-02-08 |
| 11199767 | Apparatus and method for generating an electromagnetic radiation | Chung-Chieh Lee, Feng Yuan Hsu, Chyi Shyuan Chern, Chi-Ming Yang, Chun-Lin Chang | 2021-12-14 |
| 10509311 | Apparatus and method for generating an electromagnetic radiation | Chung-Chieh Lee, Feng Yuan Hsu, Chyi Shyuan Chern, Chi-Ming Yang, Chun-Lin Chang | 2019-12-17 |
| 10310380 | High-brightness light source | Chun-Lin Chang | 2019-06-04 |
| 10162276 | Apparatus for shielding reticle | Wen-Hao Cheng, Chue-San Yoo | 2018-12-25 |
| 9864270 | Pellicle and method for manufacturing the same | Jeng-Shin Ma, Chi-Ming Yang, Chyi Shyuan Chern, Chih-Cheng Lin, Yun-Yue Lin | 2018-01-09 |
| 9847302 | Wafer surface conditioning for stability in fab environment | Fang-Wei Lin | 2017-12-19 |
| 9538628 | Method for EUV power improvement with fuel droplet trajectory stabilization | Jaw-Jung Shin | 2017-01-03 |
| 9389506 | Photoresist having improved extreme-ultraviolet lithography imaging performance | Shu-Hao Chang, Chih-Tsung Shih | 2016-07-12 |
| 9213232 | Reflective mask and method of making same | Pei-Cheng Hsu, Chih-Tsung Shih, Chia-Jen Chen, Shinn-Sheng Yu, Hsin-Chang Lee +1 more | 2015-12-15 |
| 9081280 | Photoresist having improved extreme-ultraviolet lithography imaging performance | Shu-Hao Chang, Chih-Tsung Shih | 2015-07-14 |
| 8988652 | Method and apparatus for ultraviolet (UV) patterning with reduced outgassing | Shu-Hao Chang, Chia-Hao Hsu, Chia-Chen Chen, Ying-Yu Chen, Tzu-Li Lee +3 more | 2015-03-24 |
| 8877409 | Reflective mask and method of making same | Pei-Cheng Hsu, Chih-Tsung Shih, Chia-Jen Chen, Shinn-Sheng Yu, Hsin-Chang Lee +1 more | 2014-11-04 |
| 8815496 | Method for patterning a photosensitive layer | Hsiao-Tzu Lu, Kuei-Shun Chen, Vencent Chang, George Liu | 2014-08-26 |
| 8765330 | Phase shift mask for extreme ultraviolet lithography and method of fabricating same | Chia-Tsung Shih, Pei-Chung Hsu, Shinn-Sheng Yu, Yen-Cheng Lu, Shu-Hao Chang +3 more | 2014-07-01 |
| 8394576 | Method for patterning a photosensitive layer | Hsiao-Tzu Lu, Kuei-Shun Chen, Vencent Chang, George Liu | 2013-03-12 |
| 8124323 | Method for patterning a photosensitive layer | Hsiao-Tzu Lu, Keui Shun Chen, Vencent Chang, George Liu | 2012-02-28 |
| 7838173 | Structure design and fabrication on photomask for contact hole manufacturing process window enhancement | Ya Hui Chang, Shih-Che Wang | 2010-11-23 |
| 7169701 | Dual damascene trench formation to avoid low-K dielectric damage | Chen-Nan Yeh, Chao-Cheng Chen | 2007-01-30 |
| 6383693 | Method of forming a photomask utilizing electron beam dosage compensation method employing dummy pattern | Fei-Gwo Tsai | 2002-05-07 |