Issued Patents All Time
Showing 1–25 of 130 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429776 | Lithography method with reduced impacts of mask defects | Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Sheng-Chi Chin, Anthony Yen | 2025-09-30 |
| 12406130 | Geometric mask rule check with favorable and unfavorable zones | Shih-Ming Chang, Jue-Chin Yu, Ping-Chieh Wu | 2025-09-02 |
| 12235589 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen, Shuo-Yen Chou +1 more | 2025-02-25 |
| 12019974 | Geometric mask rule check with favorable and unfavorable zones | Shih-Ming Chang, Jue-Chin Yu, Ping-Chieh Wu | 2024-06-25 |
| 11714951 | Geometric mask rule check with favorable and unfavorable zones | Shih-Ming Chang, Jue-Chin Yu, Ping-Chieh Wu | 2023-08-01 |
| 11709435 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen, Shuo-Yen Chou +1 more | 2023-07-25 |
| 11675962 | Vertex-based OPC for opening patterning | — | 2023-06-13 |
| 11429027 | Photolithography method and apparatus | Ru-Gun Liu, Hsu-Ting Huang, Chin-Hsiang Lin | 2022-08-30 |
| 11320747 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen, Shuo-Yen Chou +1 more | 2022-05-03 |
| 11295056 | Vertex-based OPC for opening patterning | — | 2022-04-05 |
| 11086227 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Chia-Chen Chen, Jeng-Horng Chen, Anthony Yen | 2021-08-10 |
| 11073755 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2021-07-27 |
| 10976655 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2021-04-13 |
| 10955746 | Lithography method with reduced impacts of mask defects | Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Sheng-Chi Chin, Anthony Yen | 2021-03-23 |
| 10866525 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen, Shuo-Yen Chou +1 more | 2020-12-15 |
| 10867112 | Methods of making mask using transmission cross coefficient (TCC) matrix of lithography process optical system | Hsu-Ting Huang, Ru-Gun Liu | 2020-12-15 |
| 10831094 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2020-11-10 |
| 10747097 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2020-08-18 |
| 10691014 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2020-06-23 |
| 10684552 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Chia-Chen Chen, Jeng-Horng Chen, Anthony Yen | 2020-06-16 |
| 10520806 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2019-12-31 |
| 10276372 | Method for integrated circuit patterning | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2019-04-30 |
| 10274819 | EUV pellicle fabrication methods and structures thereof | Pei-Cheng Hsu, Chih-Tsung Shih, Jeng-Horng Chen, Chih-Cheng Lin, Hsin-Chang Lee +2 more | 2019-04-30 |
| 10168611 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2019-01-01 |
| 10162257 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2018-12-25 |