Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12265334 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Chih-Jie Lee, Ru-Gun Liu | 2025-04-01 |
| 12235589 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Shinn-Sheng Yu, Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen +1 more | 2025-02-25 |
| 11789370 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Chih-Jie Lee, Ru-Gun Liu | 2023-10-17 |
| 11709435 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Shinn-Sheng Yu, Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen +1 more | 2023-07-25 |
| 11320747 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Shinn-Sheng Yu, Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen +1 more | 2022-05-03 |
| 11243472 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Chih-Jie Lee, Ru-Gun Liu | 2022-02-08 |
| 11211374 | Photomask design for generating plasmonic effect | Minfeng Chen | 2021-12-28 |
| 10866525 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Shinn-Sheng Yu, Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen +1 more | 2020-12-15 |
| 10698320 | Method for optimized wafer process simulation | Ru-Gun Liu, Shih-Ming Chang, Zengqin Zhao, Chien-Wen Lai | 2020-06-30 |
| 10685950 | Photomask design for generating plasmonic effect | Minfeng Chen | 2020-06-16 |
| 10678142 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Chih-Jie Lee, Ru-Gun Liu | 2020-06-09 |
| 10514613 | Pattern modification and patterning process | Shih-Ming Chang, Ru-Gun Liu, Chien-Wen Lai, Zengqin Zhao | 2019-12-24 |
| 10417376 | Source beam optimization method for improving lithography printability | Hsu-Ting Huang, Ru-Gun Liu | 2019-09-17 |
| 10083270 | Target optimization method for improving lithography printability | Shih-Ming Chang, Ken-Hsien Hsieh, Ru-Gun Liu | 2018-09-25 |
| 10025175 | Method and system to prepare, manufacture and inspect mask patterns for a semiconductor device | Chi-Ming Tsai, Chih-Chiang Tu, Wen-Hao Cheng, Ru-Gun Liu | 2018-07-17 |
| 9990460 | Source beam optimization method for improving lithography printability | Hsu-Ting Huang, Ru-Gun Liu | 2018-06-05 |
| 9747408 | Generating final mask pattern by performing inverse beam technology process | Hsu-Ting Huang, Ru-Gun Liu, Tsai-Sheng Gau | 2017-08-29 |
| 9495507 | Method for integrated circuit mask patterning | Jue-Chin Yu, Lun Hsieh, Pi-Tsung Chen, Ru-Gun Liu | 2016-11-15 |
| 9256709 | Method for integrated circuit mask patterning | Jue-Chin Yu, Lun Hsieh, Pi-Tsung Chen, Ru-Gun Liu | 2016-02-09 |
| 8850366 | Method for making a mask by forming a phase bar in an integrated circuit design layout | Ru-Gun Liu, Hoi-Tou Ng, Ken-Hsien Hsieh, Yi-Yin Chen | 2014-09-30 |
| 8812999 | Method and system of mask data preparation for curvilinear mask patterns for a device | Ru-Gun Liu, Wen-Hao Cheng, Chih-Chiang Tu | 2014-08-19 |
| 8716841 | Photolithography mask and process | Shih-Ming Chang | 2014-05-06 |
| 6242361 | Plasma treatment to improve DUV photoresist process | Shyh-Dar Lee, Chien-Mei Wang, Lai-Juh Chen | 2001-06-05 |