Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12265334 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Shuo-Yen Chou, Ru-Gun Liu | 2025-04-01 |
| 12085867 | Lithography process monitoring method | Shih-Chun Huang, Shih-Ming Chang, Ken-Hsien Hsieh, Yung-Sung Yen, Ru-Gun Liu | 2024-09-10 |
| 11789370 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Shuo-Yen Chou, Ru-Gun Liu | 2023-10-17 |
| 11782352 | Lithography process monitoring method | Shih-Chun Huang, Shih-Ming Chang, Ken-Hsien Hsieh, Yung-Sung Yen, Ru-Gun Liu | 2023-10-10 |
| 11467509 | Lithography process monitoring method | Shih-Chun Huang, Shih-Ming Chang, Ken-Hsien Hsieh, Yung-Sung Yen, Ru-Gun Liu | 2022-10-11 |
| 11243472 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Shuo-Yen Chou, Ru-Gun Liu | 2022-02-08 |
| 10962892 | Lithography process monitoring method | Shih-Chun Huang, Shih-Ming Chang, Ken-Hsien Hsieh, Yung-Sung Yen, Ru-Gun Liu | 2021-03-30 |
| 10678142 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Shuo-Yen Chou, Ru-Gun Liu | 2020-06-09 |
| 10488766 | Lithography system having invisible pellicle over mask | Chiu-Hsiang Chen, Shih-Ming Chang, Han-Wei Wu, Yung-Sung Yen, Ru-Gun Liu | 2019-11-26 |
| 10418245 | Method for integrated circuit manufacturing with directed self-assembly (DSA) | Joy Cheng | 2019-09-17 |