Issued Patents All Time
Showing 1–25 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394633 | Method of fabricating semiconductor device with reduced trench distortions | Chung-Ju Lee, Chun-Kuang Chen, Chia-Tien Wu, Ta-Ching Yu, Kuei-Shun Chen +4 more | 2025-08-19 |
| 12334342 | Pattern fidelity enhancement | Yu-Tien Shen, Ya-Wen Yeh, Wei-Liang Lin, Ya Hui Chang, Wei-Hao Wu +3 more | 2025-06-17 |
| 12266539 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chih-Ming Lai, Wei-Liang Lin, Ken-Hsien Hsieh, Chin-Hsiang Lin | 2025-04-01 |
| 12230507 | Method of manufacturing semiconductor devices using directional process | Ya-Wen Yeh, Yu-Tien Shen, Shih-Chun Huang, Po-Chin Chang, Wei-Liang Lin +4 more | 2025-02-18 |
| 12153350 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Huicheng Chang, Chia-Cheng Chen, Jyu-Horng Shieh, Liang-Yin Chen +7 more | 2024-11-26 |
| 12148653 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chin-Hsiang Lin, Chih-Ming Lai, Wei-Liang Lin | 2024-11-19 |
| 12085867 | Lithography process monitoring method | Chih-Jie Lee, Shih-Chun Huang, Shih-Ming Chang, Ken-Hsien Hsieh, Ru-Gun Liu | 2024-09-10 |
| 12062543 | Line-end extension method and device | Chih-Min HSIAO, Chien-Wen Lai, Ru-Gun Liu, Chih-Ming Lai, Shih-Ming Chang +1 more | 2024-08-13 |
| 12014926 | Self aligned litho etch process patterning method | Chih-Min HSIAO, Chien-Wen Lai, Shih-Chun Huang, Chih-Ming Lai, Ru-Gun Liu | 2024-06-18 |
| 11955338 | Directional deposition for semiconductor fabrication | Shih-Chun Huang, Ya-Wen Yeh, Chien-Wen Lai, Wei-Liang Lin, Ya Hui Chang +3 more | 2024-04-09 |
| 11894238 | Method of fabricating semiconductor device with reduced trench distortions | Chung-Ju Lee, Chun-Kuang Chen, Chia-Tien Wu, Ta-Ching Yu, Kuei-Shun Chen +4 more | 2024-02-06 |
| 11862465 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2024-01-02 |
| 11854996 | Method for fabricating semiconductor device | Chiu-Hsiang Chen, Shih-Chun Huang, Ru-Gun Liu | 2023-12-26 |
| 11854807 | Line-end extension method and device | Chih-Min HSIAO, Chien-Wen Lai, Ru-Gun Liu, Chih-Ming Lai, Shih-Ming Chang +1 more | 2023-12-26 |
| 11796922 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Huicheng Chang, Chia-Cheng Chen, Jyu-Horng Shieh, Liang-Yin Chen +7 more | 2023-10-24 |
| 11791161 | Pattern fidelity enhancement | Yu-Tien Shen, Ya-Wen Yeh, Wei-Liang Lin, Ya Hui Chang, Wei-Hao Wu +3 more | 2023-10-17 |
| 11782352 | Lithography process monitoring method | Chih-Jie Lee, Shih-Chun Huang, Shih-Ming Chang, Ken-Hsien Hsieh, Ru-Gun Liu | 2023-10-10 |
| 11764068 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chih-Ming Lai, Wei-Liang Lin, Ken-Hsien Hsieh, Chin-Hsiang Lin | 2023-09-19 |
| 11651972 | Method of manufacturing semiconductor devices using directional process | Ya-Wen Yeh, Yu-Tien Shen, Shih-Chun Huang, Po-Chin Chang, Wei-Liang Lin +4 more | 2023-05-16 |
| 11610778 | Self aligned litho etch process patterning method | Chih-Min HSIAO, Chien-Wen Lai, Shih-Chun Huang, Chih-Ming Lai, Ru-Gun Liu | 2023-03-21 |
| 11569090 | Directional deposition for semiconductor fabrication | Shih-Chun Huang, Ya-Wen Yeh, Chien-Wen Lai, Wei-Liang Lin, Ya Hui Chang +3 more | 2023-01-31 |
| 11467509 | Lithography process monitoring method | Chih-Jie Lee, Shih-Chun Huang, Shih-Ming Chang, Ken-Hsien Hsieh, Ru-Gun Liu | 2022-10-11 |
| 11387113 | Method of fabricating semiconductor device with reduced trench distortions | Chung-Ju Lee, Chun-Kuang Chen, Chia-Tien Wu, Ta-Ching Yu, Kuei-Shun Chen +4 more | 2022-07-12 |
| 11342193 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chih-Ming Lai, Wei-Liang Lin, Ken-Hsien Hsieh, Chin-Hsiang Lin | 2022-05-24 |
| 11289332 | Directional processing to remove a layer or a material formed over a substrate | Shih-Chun Huang, Chin-Hsiang Lin, Chien-Wen Lai, Ru-Gun Liu, Wei-Liang Lin +3 more | 2022-03-29 |