Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12431431 | Conductive structure interconnects with downward projections | Tzu-Pei Chen, Chia-Hao Chang, Shin-Yi Yang, Chia-Hung Chu, Shuen-Shin Liang +6 more | 2025-09-30 |
| 12432977 | Semiconductor device and method for manufacturing the same | Shuen-Shin Liang, Min-Chiang Chuang, Chia-Cheng Chen, Chun-Hung Wu, Liang-Yin Chen +12 more | 2025-09-30 |
| 12433006 | Semiconductor device with conductive liners over silicide structures and method of making the semiconductor device | Kuan-Kan Hu, Shuen-Shin Liang, Chia-Hung Chu, Hsu-Kai Chang, Ken-Yu Chang +8 more | 2025-09-30 |
| 12408406 | Semiconductor device and manufacturing method thereof | Lin-Yu Huang | 2025-09-02 |
| 12327788 | Gate to source drain interconnects | Shuen-Shin Liang, Chia-Hung Chu, Tzu-Pei Chen, Ken-Yu Chang, Hung-Yi Huang +6 more | 2025-06-10 |
| 12261082 | Semiconductor devices with a nitrided capping layer | Lin-Yu Huang, Shuen-Shin Liang, Sheng-Tsung Wang, Cheng-Chi Chuang, Chia-Hung Chu +3 more | 2025-03-25 |
| 12230507 | Method of manufacturing semiconductor devices using directional process | Ya-Wen Yeh, Yu-Tien Shen, Shih-Chun Huang, Wei-Liang Lin, Yung-Sung Yen +4 more | 2025-02-18 |
| 12094951 | Capping structures in semiconductor devices | Ming-Huan Tsai, Li-Te Lin, Pinyen Lin | 2024-09-17 |
| 12087558 | Ion beam etching apparatus and method | Jung-Hao Chang, Pinyen Lin, Li-Te Lin | 2024-09-10 |
| 12051620 | Semiconductor structure and method for manufacturing the same | Hung-Chang Sun, Akira Mineji, Zi-Wei Fang, Pinyen Lin | 2024-07-30 |
| 12034059 | Reducing pattern loading in the etch-back of metal gate | Wei-Hao Wu, Li-Te Lin, Pinyen Lin | 2024-07-09 |
| 11978672 | Semiconductor device with elongated pattern | Li-Te Lin, Pinyen Lin | 2024-05-07 |
| 11881401 | Method of forming metal features | Li-Te Lin, Ru-Gun Liu, Wei-Liang Lin, Pinyen Lin, Yu-Tien Shen +1 more | 2024-01-23 |
| 11862465 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Chien-Wen Lai +7 more | 2024-01-02 |
| 11651972 | Method of manufacturing semiconductor devices using directional process | Ya-Wen Yeh, Yu-Tien Shen, Shih-Chun Huang, Wei-Liang Lin, Yung-Sung Yen +4 more | 2023-05-16 |
| 11652152 | Capping structures in semiconductor devices | Ming-Huan Tsai, Li-Te Lin, Pinyen Lin | 2023-05-16 |
| 11626506 | Reducing pattern loading in the etch-back of metal gate | Wei-Hao Wu, Li-Te Lin, Pinyen Lin | 2023-04-11 |
| 11469143 | Semiconductor device with elongated pattern | Li-Te Lin, Pinyen Lin | 2022-10-11 |
| 11373902 | Semiconductor structure and method for manufacturing the same | Hung-Chang Sun, Akira Mineji, Zi-Wei Fang, Pinyen Lin | 2022-06-28 |
| 11313989 | Detecting device | Min-Chun Pan, Wei-Hao Lee, Tsung-Hsuan Su | 2022-04-26 |
| 11239078 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Chien-Wen Lai +7 more | 2022-02-01 |
| 11094556 | Method of manufacturing semiconductor devices using directional process | Ya-Wen Yeh, Yu-Tien Shen, Shih-Chun Huang, Wei-Liang Lin, Yung-Sung Yen +4 more | 2021-08-17 |
| 11043381 | Directional patterning method | Li-Te Lin, Ru-Gun Liu, Wei-Liang Lin, Pinyen Lin, Yu-Tien Shen +1 more | 2021-06-22 |
| 10998421 | Reducing pattern loading in the etch-back of metal gate | Wei-Hao Wu, Li-Te Lin, Pinyen Lin | 2021-05-04 |
| 10790195 | Elongated pattern and formation thereof | Li-Te Lin, Pinyen Lin | 2020-09-29 |