Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12363980 | Spacer structure for semiconductor device | Chen-Han Wang, Ding-Kang Shih, Chun-Hsiung Lin, Teng-Chun Tsai, Zhi-Chang Lin +1 more | 2025-07-15 |
| 12347725 | Semiconductor structure with material modification and low resistance plug | Mrunal A. Khaderbad | 2025-07-01 |
| 12224210 | Method for FinFet fabrication and structure thereof | Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Tze-Chung Lin, Chao-Hsien Huang +2 more | 2025-02-11 |
| 12165912 | Semiconductor structure with air gap and method sealing the air gap | Hung-Chang Sun, Ziwei Fang | 2024-12-10 |
| 12080779 | Capping layer for gate electrodes | Chin-Hsiang Lin, Teng-Chun Tsai, Huang-Lin Chao | 2024-09-03 |
| 12051620 | Semiconductor structure and method for manufacturing the same | Hung-Chang Sun, Po-Chin Chang, Zi-Wei Fang, Pinyen Lin | 2024-07-30 |
| 11854871 | Semiconductor structure with material modification and low resistance plug | Mrunal A. Khaderbad | 2023-12-26 |
| 11728414 | Semiconductor device including a Fin-FET and method of manufacturing the same | Yasutoshi Okuno, Cheng-Yi Peng, Ziwei Fang, I-Ming Chang, Yu-Ming Lin +1 more | 2023-08-15 |
| 11688631 | Semiconductor structure with air gap and method sealing the air gap | Hung-Chang Sun, Ziwei Fang | 2023-06-27 |
| 11646234 | Method for FinFET fabrication and structure thereof | Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Tze-Chung Lin, Chao-Hsien Huang +2 more | 2023-05-09 |
| 11398404 | Semiconductor structure with air gap and method sealing the air gap | Hung-Chang Sun, Ziwei Fang | 2022-07-26 |
| 11373902 | Semiconductor structure and method for manufacturing the same | Hung-Chang Sun, Po-Chin Chang, Zi-Wei Fang, Pinyen Lin | 2022-06-28 |
| 11373910 | Semiconductor device including a Fin-FET and method of manufacturing the same | Yasutoshi Okuno, Cheng-Yi Peng, Ziwei Fang, I-Ming Chang, Yu-Ming Lin +1 more | 2022-06-28 |
| 11264485 | Spacer structure for semiconductor device | Chen-Han Wang, Ding-Kang Shih, Chun-Hsiung Lin, Teng-Chun Tsai, Zhi-Chang Lin +1 more | 2022-03-01 |
| 11251087 | Semiconductor device including a Fin-FET and method of manufacturing the same | Yasutoshi Okuno, Cheng-Yi Peng, Ziwei Fang, I-Ming Chang, Yu-Ming Lin +1 more | 2022-02-15 |
| 11164956 | Capping layer for gate electrodes | Chin-Hsiang Lin, Teng-Chun Tsai, Huang-Lin Chao | 2021-11-02 |
| 11056393 | Method for FinFET fabrication and structure thereof | Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Tze-Chung Lin, Chao-Hsien Huang +2 more | 2021-07-06 |
| 11018053 | Semiconductor structure with material modification and low resistance plug | Mrunal A. Khaderbad | 2021-05-25 |
| 10854503 | Semiconductor structure with air gap and method sealing the air gap | Hung-Chang Sun, Ziwei Fang | 2020-12-01 |
| 10692760 | Semiconductor structure and method for manufacturing the same | Hung-Chang Sun, Po-Chin Chang, Zi-Wei Fang, Pinyen Lin | 2020-06-23 |
| 10685884 | Semiconductor device including a Fin-FET and method of manufacturing the same | Yasutoshi Okuno, Cheng-Yi Peng, Ziwei Fang, I-Ming Chang, Yu-Ming Lin +1 more | 2020-06-16 |
| 7259075 | Method for manufacturing field effect transistor | — | 2007-08-21 |
| 7259056 | Method for manufacturing semiconductor device | — | 2007-08-21 |
| 6492218 | Use of a hard mask in the manufacture of a semiconductor device | — | 2002-12-10 |
| 6372591 | Fabrication method of semiconductor device using ion implantation | Seiichi Shishiguchi, Shuichi Saito | 2002-04-16 |