Issued Patents All Time
Showing 26–50 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11239078 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2022-02-01 |
| 11158509 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Ching-Yu Chang +7 more | 2021-10-26 |
| 11094556 | Method of manufacturing semiconductor devices using directional process | Ya-Wen Yeh, Yu-Tien Shen, Shih-Chun Huang, Po-Chin Chang, Wei-Liang Lin +4 more | 2021-08-17 |
| 11088030 | Semiconductor device and a method for fabricating the same | Jui-Yao Lai, Ru-Gun Liu, Sai-Hooi Yeong, Yen-Ming Chen, Ying-Yan Chen | 2021-08-10 |
| 11075079 | Directional deposition for semiconductor fabrication | Shih-Chun Huang, Ya-Wen Yeh, Chien-Wen Lai, Wei-Liang Lin, Ya Hui Chang +3 more | 2021-07-27 |
| 11024579 | Dual power structure with connection pins | Shih-Wei Peng, Chih-Ming Lai, Chun-Kuang Chen, Chih-Liang Chen, Charles Chew-Yuen Young +3 more | 2021-06-01 |
| 11004729 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chin-Hsiang Lin, Chih-Ming Lai, Wei-Liang Lin | 2021-05-11 |
| 10991657 | Method for fabricating semiconductor device | Chiu-Hsiang Chen, Shih-Chun Huang, Ru-Gun Liu | 2021-04-27 |
| 10991583 | Self aligned litho etch process patterning method | Chih-Min HSIAO, Chien-Wen Lai, Shih-Chun Huang, Chih-Ming Lai, Ru-Gun Liu | 2021-04-27 |
| 10962892 | Lithography process monitoring method | Chih-Jie Lee, Shih-Chun Huang, Shih-Ming Chang, Ken-Hsien Hsieh, Ru-Gun Liu | 2021-03-30 |
| 10957551 | Fin-like field effect transistor patterning methods for increasing process margins | Chin-Yuan Tseng, Wei-Liang Lin, Hsin-Chih Chen, Shi Ning Ju, Ken-Hsien Hsieh +1 more | 2021-03-23 |
| 10916475 | Semiconductor device and a method for fabricating the same | Jui-Yao Lai, Ying-Yan Chen, Yen-Ming Chen, Sai-Hooi Yeong, Ru-Gun Liu | 2021-02-09 |
| 10861790 | Power strap structure for high performance and low current density | Chih-Liang Chen, Chih-Ming Lai, Charles Chew-Yuen Young, Chi-Yeh Yu, Jiann-Tyng Tzeng +6 more | 2020-12-08 |
| 10861698 | Pattern fidelity enhancement | Yu-Tien Shen, Ya-Wen Yeh, Wei-Liang Lin, Ya Hui Chang, Wei-Hao Wu +3 more | 2020-12-08 |
| 10818509 | Method of fabricating semiconductor device with reduced trench distortions | Chung-Ju Lee, Chun-Kuang Chen, Chia-Tien Wu, Ta-Ching Yu, Kuei-Shun Chen +4 more | 2020-10-27 |
| 10790155 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chih-Ming Lai, Wei-Liang Lin, Ken-Hsien Hsieh, Chin-Hsiang Lin | 2020-09-29 |
| 10763113 | Lithographic technique for feature cut by line-end shrink | Chun-Kuang Chen, Ko-Bin Kao, Ken-Hsien Hsieh, Ru-Gun Liu | 2020-09-01 |
| 10748767 | Method for forming conductive lines | Ken-Hsien Hsieh, Ru-Gun Liu | 2020-08-18 |
| 10707081 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2020-07-07 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Ching-Yu Chang +7 more | 2020-05-19 |
| 10488766 | Lithography system having invisible pellicle over mask | Chiu-Hsiang Chen, Shih-Ming Chang, Chih-Jie Lee, Han-Wei Wu, Ru-Gun Liu | 2019-11-26 |
| 10418252 | Fin-like field effect transistor patterning methods for increasing process margins | Chin-Yuan Tseng, Wei-Liang Lin, Hsin-Chih Chen, Shi Ning Ju, Ken-Hsien Hsieh +1 more | 2019-09-17 |
| 10388523 | Lithographic technique for feature cut by line-end shrink | Chun-Kuang Chen, Ko-Bin Kao, Ken-Hsien Hsieh, Ru-Gun Liu | 2019-08-20 |
| 10354874 | Directional processing to remove a layer or a material formed over a substrate | Shih-Chun Huang, Chin-Hsiang Lin, Chien-Wen Lai, Ru-Gun Liu, Wei-Liang Lin +3 more | 2019-07-16 |
| 10276377 | Method for patterning interconnects | Yu-Hsun Chen, Chen-Hau Wu, Chun-Kuang Chen, Ta-Ching Yu, Ken-Hsien Hsieh +2 more | 2019-04-30 |