Issued Patents All Time
Showing 1–25 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12334920 | Level shifter | Jung-Tsun Chuang, Shao-Chang Huang, Li-Fan Chen, Chun-Chih Chen, Gong-Kai Lin | 2025-06-17 |
| 12189296 | Lithography process and material for negative tone development | Wei-Han Lai, Ching-Yu Chang | 2025-01-07 |
| 12019375 | Photosensitive material and method of lithography | An-Ren Zi, Ching-Yu Chang | 2024-06-25 |
| 11940828 | Voltage tracking circuits with low power consumption and electronic circuits using the same | Shao-Chang Huang, Yeh-Ning Jou, Ching-Ho Li, Kai-Chieh Hsu, Chun-Chih Chen +2 more | 2024-03-26 |
| 11809080 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Wei-Han Lai, Chin-Hsiang Lin | 2023-11-07 |
| 11703766 | Materials and methods for forming resist bottom layer | Jing Hong Huang, Shang-Wern Chang, Ching-Yu Chang | 2023-07-18 |
| 11442364 | Materials and methods for forming resist bottom layer | Jing Hong Huang, Shang-Wern Chang, Ching-Yu Chang | 2022-09-13 |
| 11422465 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Wei-Han Lai, Chin-Hsiang Lin | 2022-08-23 |
| 11320738 | Pattern formation method and material for manufacturing semiconductor devices | Ching-Yu Chang, Shang-Wern Chang, Yen-Hao Chen | 2022-05-03 |
| 11157997 | Systems and methods for analyzing data | Chuck Robida | 2021-10-26 |
| 11158509 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Ching-Yu Chang, Chih-Yuan Ting +7 more | 2021-10-26 |
| 11106138 | Lithography process and material for negative tone development | Wei-Han Lai, Ching-Yu Chang | 2021-08-31 |
| 11062905 | Patterning process of a semiconductor structure with a middle layer | Chien-Chih Chen | 2021-07-13 |
| 11003076 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Wei-Han Lai, Chin-Hsiang Lin | 2021-05-11 |
| 10879078 | Method of patterning resist layer and method of forming semiconductor structure using patterned resist layer | Li-Po YANG, Ching-Yu Chang | 2020-12-29 |
| 10872773 | Methods of reducing pattern roughness in semiconductor fabrication | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-22 |
| 10802402 | Material composition and process for substrate modification | Wei-Han Lai, Ching-Yu Chang, Chin-Hsiang Lin | 2020-10-13 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Ching-Yu Chang, Chih-Yuan Ting +7 more | 2020-05-19 |
| 10520813 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Wei-Han Lai, Chin-Hsiang Lin | 2019-12-31 |
| 10515812 | Methods of reducing pattern roughness in semiconductor fabrication | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2019-12-24 |
| 10503070 | Photosensitive material and method of lithography | An-Ren Zi, Ching-Yu Chang | 2019-12-10 |
| 10487184 | Continuous process for preparing a polyester shrinkable film | Ching-Chun Tsai, Tsung-Hung Liu, Tsan-Chin Chang, Chi-Feng Lin, Jie Shiu +1 more | 2019-11-26 |
| 10468249 | Patterning process of a semiconductor structure with a middle layer | Chien-Chih Chen | 2019-11-05 |
| 10401728 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Wei-Han Lai, Chin-Hsiang Lin | 2019-09-03 |
| 10394126 | Photolithography process and materials | Ya-Ling Cheng, Ching-Yu Chang, Yen-Hao Chen | 2019-08-27 |