Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11703766 | Materials and methods for forming resist bottom layer | Jing Hong Huang, Chien-Wei Wang, Ching-Yu Chang | 2023-07-18 |
| 11442364 | Materials and methods for forming resist bottom layer | Jing Hong Huang, Chien-Wei Wang, Ching-Yu Chang | 2022-09-13 |
| 11320738 | Pattern formation method and material for manufacturing semiconductor devices | Chien-Wei Wang, Ching-Yu Chang, Yen-Hao Chen | 2022-05-03 |
| 9814097 | Baking apparatus for priming substrate | Chien-Hung Wang, Ren-Jyh Leu, Heng-Hsin Liu | 2017-11-07 |
| 9563946 | Overlay metrology method and overlay control method and system | Yung-Yao Lee, Ying-Ying Wang, Heng-Hsin Liu | 2017-02-07 |
| 9281205 | Method for etching an ultra thin film | Chia-Chu Liu, Kuei-Shun Chen, Chih-Yang Yeh | 2016-03-08 |
| 6441115 | Photosensitive polymer | Yen-Cheng Li, Shang-Ho Lin | 2002-08-27 |
| 6376700 | Alicyclic compound | Yen-Cheng Li, Shang-Ho Lin, Wen-Chieh Wang | 2002-04-23 |
| 6316159 | Chemical amplified photoresist composition | Yen-Cheng Li, Shang-Ho Lin | 2001-11-13 |
| 6294309 | Positive photoresist composition containing alicyclic dissolution inhibitors | Yen-Cheng Li, Shang-Ho Lin, Wen-Chieh Wang | 2001-09-25 |
| 6271412 | Photosensitive monomer | Yen-Cheng Li, Shang-Ho Lin | 2001-08-07 |
| 6265131 | Alicyclic dissolution inhibitors and positive potoresist composition containing the same | Yen-Cheng Li, Shang-Ho Lin, Wen-Chieh Wang | 2001-07-24 |