Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6441115 | Photosensitive polymer | Shang-Wern Chang, Yen-Cheng Li | 2002-08-27 |
| 6376700 | Alicyclic compound | Shang-Wern Chang, Yen-Cheng Li, Wen-Chieh Wang | 2002-04-23 |
| 6316159 | Chemical amplified photoresist composition | Shang-Wern Chang, Yen-Cheng Li | 2001-11-13 |
| 6294309 | Positive photoresist composition containing alicyclic dissolution inhibitors | Shang-Wern Chang, Yen-Cheng Li, Wen-Chieh Wang | 2001-09-25 |
| 6271412 | Photosensitive monomer | Shang-Wern Chang, Yen-Cheng Li | 2001-08-07 |
| 6265131 | Alicyclic dissolution inhibitors and positive potoresist composition containing the same | Shang-Wern Chang, Yen-Cheng Li, Wen-Chieh Wang | 2001-07-24 |