Issued Patents All Time
Showing 26–50 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10312108 | Method for forming semiconductor structure using modified resist layer | Li-Po YANG, Wei-Han Lai, Chin-Hsiang Lin | 2019-06-04 |
| 10163632 | Material composition and process for substrate modification | Wei-Han Lai, Ching-Yu Chang, Chin-Hsiang Lin | 2018-12-25 |
| 10048590 | Method and apparatus of patterning a semiconductor device | Ming-Feng Shieh, Ching-Yu Chang | 2018-08-14 |
| 10042252 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Wei-Han Lai, Chin-Hsiang Lin | 2018-08-07 |
| 9983474 | Photoresist having sensitizer bonded to acid generator | Yen-Hao Chen | 2018-05-29 |
| 9958779 | Photoresist additive for outgassing reduction and out-of-band radiation absorption | Wei-Han Lai, Ching-Yu Chang | 2018-05-01 |
| 9921480 | Extreme ultraviolet photoresist | Wei-Han Lai, Ching-Yu Chang | 2018-03-20 |
| 9864275 | Lithographic resist with floating protectant | Ching-Yu Chang, Hsueh-An Chen | 2018-01-09 |
| 9589785 | Cleaning method and composition in photolithography | Ya-Ling Cheng | 2017-03-07 |
| 9389510 | Patterning process and chemical amplified photoresist composition | Ching-Yu Chang | 2016-07-12 |
| 9323155 | Double patterning strategy for contact hole and trench in photolithography | Chun-Kuang Chen, Hsiao-Wei Yeh, Chih-An Lin, Feng-Cheng Hsu | 2016-04-26 |
| 9046785 | Method and apparatus of patterning a semiconductor device | Ming-Feng Shieh, Ching-Yu Chang | 2015-06-02 |
| 9029062 | Photoresist and patterning process | Chun-Ching Huang | 2015-05-12 |
| 8956806 | Photoresist and patterning process | Ching-Yu Chang, Burn Jeng Lin | 2015-02-17 |
| 8841066 | Photoresist stripping technique | Ching-Yu Chang | 2014-09-23 |
| 8822347 | Wet soluble lithography | Ching-Yu Chang | 2014-09-02 |
| 8741552 | Double patterning strategy for contact hole and trench in photolithography | Chun-Kuang Chen, Hsiao-Wei Yeh, Chih-An Lin, Feng-Cheng Hsu | 2014-06-03 |
| 8658344 | Patterning process and photoresist with a photodegradable base | Ching-Yu Chang, Tsai-Sheng Gau, Burn Jeng Lin | 2014-02-25 |
| 8586290 | Patterning process and chemical amplified photoresist composition | Ching-Yu Chang | 2013-11-19 |
| 8563231 | Patterning process and materials for lithography | Ko-Bin Kao, Wei-Liang Lin, Jui-Ching Wu, Chia-Hsiang Lin, Ai-Jen Jung | 2013-10-22 |
| 8512939 | Photoresist stripping technique | Ching-Yu Chang | 2013-08-20 |
| 8304179 | Method for manufacturing a semiconductor device using a modified photosensitive layer | Ching-Yu Chang | 2012-11-06 |
| 8216767 | Patterning process and chemical amplified photoresist with a photodegradable base | Ching-Yu Chang, Tsai-Sheng Gau, Burn Jeng Lin | 2012-07-10 |
| 8105954 | System and method of vapor deposition | David Lu, Ching-Yu Chang | 2012-01-31 |
| 7711636 | Systems and methods for analyzing data | Chuck Robida | 2010-05-04 |