Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9698080 | Conductor structure for three-dimensional semiconductor device | Wen-Chih Chiou | 2017-07-04 |
| 9130024 | Three-dimensional semiconductor device | Wen-Chih Chiou | 2015-09-08 |
| 8822331 | Anchored damascene structures | Horng-Huei Tseng, Syun-Ming Jang | 2014-09-02 |
| 8368220 | Anchored damascene structures | Horng-Huei Tseng, Syun-Ming Jang | 2013-02-05 |
| 8237209 | Capacitors integrated with metal gate formation | Chung-Long Chang, Chia-Yi Chen, I-Lu Wu | 2012-08-07 |
| 8179516 | Protective layer on objective lens for liquid immersion lithography applications | Burn Jeng Lin | 2012-05-15 |
| 8178289 | System and method for photolithography in semiconductor manufacturing | Kuei-Shun Chen, Chin-Hsiang Lin | 2012-05-15 |
| 8134235 | Three-dimensional semiconductor device | Wen-Chih Chiou | 2012-03-13 |
| 8105954 | System and method of vapor deposition | Chien-Wei Wang, Ching-Yu Chang | 2012-01-31 |
| 8053865 | MOM capacitors integrated with air-gaps | Chung-Long Chang, Ming-Shih Yeh, Chia-Yi Chen | 2011-11-08 |
| 8054444 | Lens cleaning module for immersion lithography apparatus | Burn Jeng Lin | 2011-11-08 |
| 8022458 | Capacitors integrated with metal gate formation | Chung-Long Chang, Chia-Yi Chen, I-Lu Wu | 2011-09-20 |
| 7924397 | Anti-corrosion layer on objective lens for liquid immersion lithography applications | Burn Jeng Lin | 2011-04-12 |
| 7760144 | Antennas integrated in semiconductor chips | Chung-Long Chang, Shine C. Chung | 2010-07-20 |
| 7582494 | Device structures for reducing device mismatch due to shallow trench isolation induced oxides stresses | Shine C. Chung | 2009-09-01 |
| 7501227 | System and method for photolithography in semiconductor manufacturing | Kuei-Shun Chen, Chin-Hsiang Lin | 2009-03-10 |
| 7462561 | Contact structure formed using supercritical cleaning fluid and ALCVD | Horng-Huei Tseng, Syun-Ming Jang | 2008-12-09 |
| 7420188 | Exposure method and apparatus for immersion lithography | Ching-Yu Chang, Chin-Hsiang Lin, Burn Jeng Lin | 2008-09-02 |
| 7259393 | Device structures for reducing device mismatch due to shallow trench isolation induced oxides stresses | Shine C. Chung | 2007-08-21 |
| 7224427 | Megasonic immersion lithography exposure apparatus and method | Ching-Yu Chang, Chien-Hung Lin, Chin-Hsiang Lin, Horng-Huei Tseng, Burn Jeng Lin | 2007-05-29 |