Issued Patents All Time
Showing 1–25 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347683 | Method of manufacturing a semiconductor device | Jing Hong Huang, Ching-Yu Chang | 2025-07-01 |
| 12300507 | Method of manufacturing a semiconductor device | Yen-Hao Chen, Ching-Yu Chang, Chin-Hsiang Lin | 2025-05-13 |
| 12189296 | Lithography process and material for negative tone development | Chien-Wei Wang, Ching-Yu Chang | 2025-01-07 |
| 12189293 | Method of manufacturing a semiconductor device | Chieh Hsieh, Ching-Yu Chang | 2025-01-07 |
| 12189287 | Photoresist composition and method of forming photoresist pattern | Li-Po YANG, Ching-Yu Chang | 2025-01-07 |
| 12191147 | Coating composition for photolithography | Ya-Ting Lin, Yen-Ting Chen | 2025-01-07 |
| 12148610 | Spin on carbon composition and method of manufacturing a semiconductor device | Jing Hong Huang, Ching-Yu Chang | 2024-11-19 |
| 12134690 | Photoresist composition and method of manufacturing a semiconductor device | Yen-Hao Chen, Ching-Yu Chang | 2024-11-05 |
| 12074027 | Underlayer of multilayer structure and methods of use thereof | Jing Hong Huang, Ching-Yu Chang | 2024-08-27 |
| 12054699 | Perfusion cell culture device and perfusion cell culture system | Jen-Huang Huang, Yu-Lun Lu | 2024-08-06 |
| 11955336 | Method of manufacturing a semiconductor device | Jing Hong Huang, Ching-Yu Chang | 2024-04-09 |
| 11935757 | Method of manufacturing a semiconductor device | Yen-Hao Chen, Ching-Yu Chang, Chin-Hsiang Lin | 2024-03-19 |
| 11914301 | Photoresist, method of manufacturing a semiconductor device and method of extreme ultraviolet lithography | Chieh Hsieh, Ching-Yu Chang | 2024-02-27 |
| 11809080 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Chin-Hsiang Lin, Chien-Wei Wang | 2023-11-07 |
| 11796918 | Underlayer material for photoresist | An-Ren Zi, Ching-Yu Chang | 2023-10-24 |
| 11728161 | Spin on carbon composition and method of manufacturing a semiconductor device | Jing Hong Huang, Ching-Yu Chang | 2023-08-15 |
| 11714355 | Photoresist composition and method of forming photoresist pattern | Li-Po YANG, Ching-Yu Chang | 2023-08-01 |
| 11626293 | Method of manufacturing a semiconductor device | Yen-Hao Chen, Ching-Yu Chang, Chin-Hsiang Lin | 2023-04-11 |
| 11594511 | Bonding device and bonding method | Chih-Cheng Hung | 2023-02-28 |
| 11550220 | Negative tone photoresist for EUV lithography | Li-Po YANG, Ching-Yu Chang | 2023-01-10 |
| 11476108 | Spin on carbon composition and method of manufacturing a semiconductor device | Jing Hong Huang, Ching-Yu Chang | 2022-10-18 |
| 11422465 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Chin-Hsiang Lin, Chien-Wei Wang | 2022-08-23 |
| 11295961 | Method of manufacturing a semiconductor device | Yen-Hao Chen, Ching-Yu Chang, Chin-Hsiang Lin | 2022-04-05 |
| 11269256 | Underlayer material for photoresist | An-Ren Zi, Ching-Yu Chang | 2022-03-08 |
| 11143963 | Negative tone developer for extreme ultraviolet lithography | Chen-Yu Liu, Tzu-Yang Lin, Ming-Hui Weng, Ching-Yu Chang, Chin-Hsiang Lin | 2021-10-12 |