Issued Patents All Time
Showing 26–50 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11106138 | Lithography process and material for negative tone development | Chien-Wei Wang, Ching-Yu Chang | 2021-08-31 |
| 11073763 | Photoresist and method | Ching-Yu Chang, Chen-Hau Wu | 2021-07-27 |
| 11003076 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Chien-Wei Wang, Chin-Hsiang Lin | 2021-05-11 |
| 10802402 | Material composition and process for substrate modification | Chien-Wei Wang, Ching-Yu Chang, Chin-Hsiang Lin | 2020-10-13 |
| 10698317 | Underlayer material for photoresist | An-Ren Zi, Ching-Yu Chang | 2020-06-30 |
| 10520813 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Chin-Hsiang Lin, Chien-Wei Wang | 2019-12-31 |
| 10520820 | Negative tone developer for extreme ultraviolet lithography | Chen-Yu Liu, Tzu-Yang Lin, Ming-Hui Weng, Ching-Yu Chang, Chin-Hsiang Lin | 2019-12-31 |
| 10514603 | Photoresist and method | Ching-Yu Chang, Chen-Hau Wu | 2019-12-24 |
| 10401728 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Chien-Wei Wang, Chin-Hsiang Lin | 2019-09-03 |
| 10365561 | Photoresist and method | Ching-Yu Chang, Chen-Hau Wu | 2019-07-30 |
| 10312108 | Method for forming semiconductor structure using modified resist layer | Li-Po YANG, Chien-Wei Wang, Chin-Hsiang Lin | 2019-06-04 |
| 10163632 | Material composition and process for substrate modification | Chien-Wei Wang, Ching-Yu Chang, Chin-Hsiang Lin | 2018-12-25 |
| 10163648 | Method of semiconductor device fabrication having application of material with cross-linkable component | Ching-Yu Chang, Chin-Hsiang Lin | 2018-12-25 |
| 10114286 | Photoresist and method | Chen-Hau Wu, Ching-Yu Chang | 2018-10-30 |
| 10095113 | Photoresist and method | Ching-Yu Chang | 2018-10-09 |
| 10056256 | Method of priming photoresist before application of a shrink material in a lithography process | Ching-Yu Chang | 2018-08-21 |
| 10042252 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Chien-Wei Wang, Chin-Hsiang Lin | 2018-08-07 |
| 9958779 | Photoresist additive for outgassing reduction and out-of-band radiation absorption | Ching-Yu Chang, Chien-Wei Wang | 2018-05-01 |
| 9924271 | Functional headwear | Wei-Shin Lai, Jason Wolfe | 2018-03-20 |
| 9921480 | Extreme ultraviolet photoresist | Ching-Yu Chang, Chien-Wei Wang | 2018-03-20 |
| 9810990 | Chemical treatment for lithography improvement in a negative tone development process | Ching-Yu Chang, Cheng-Han Wu, Siao-Shan Wang, Chin-Hsiang Lin | 2017-11-07 |
| 9581908 | Photoresist and method | Chen-Hau Wu, Ching-Yu Chang | 2017-02-28 |
| 9488913 | Photoresist having decreased outgassing | Ching-Yu Chang | 2016-11-08 |
| 9459536 | Negative tone developer composition for extreme ultraviolet lithography | Ching-Yu Chang | 2016-10-04 |
| 9354521 | Photoresist system and method | Ching-Yu Chang | 2016-05-31 |