Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12211698 | Method composition and methods thereof | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2025-01-28 |
| 12135502 | Resin, photoresist composition, and method of manufacturing semiconductor device | Ching-Yu Chang, Chin-Hsiang Lin | 2024-11-05 |
| 12085855 | Resin, photoresist composition, and method of manufacturing semiconductor device | Ching-Yu Chang, Chin-Hsiang Lin | 2024-09-10 |
| 11387104 | Grafting design for pattern post-treatment in semiconductor manufacturing | Ching-Yu Chang, Chin-Hsiang Lin | 2022-07-12 |
| 10915027 | Post development treatment method and material for shrinking critical dimension of photoresist layer | Ching-Yu Chang | 2021-02-09 |
| 10866515 | Lithography process using photoresist material with photosensitive functional group | Ming-Hui Weng, Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-15 |
| 10863630 | Material composition and methods thereof | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-08 |
| 10747114 | Blocking layer material composition and methods thereof in semiconductor manufacturing | Chen-Yu Liu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-08-18 |
| 10672619 | Material composition and methods thereof | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-06-02 |
| 10672610 | Grafting design for pattern post-treatment in semiconductor manufacturing | Ching-Yu Chang, Chin-Hsiang Lin | 2020-06-02 |
| 10517179 | Material composition and methods thereof | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2019-12-24 |
| 10394123 | Blocking layer material composition and methods thereof in semiconductor manufacturing | Chen-Yu Liu, Ching-Yu Chang, Chin-Hsiang Lin | 2019-08-27 |
| 10114291 | Grafting agent for forming spacer layer | Ya-Ling Cheng, Ching-Yu Chang, Chien-Chih Chen, Chun-Kuang Chen, Wei-Liang Lin | 2018-10-30 |
| 10036957 | Post development treatment method and material for shrinking critical dimension of photoresist layer | Ching-Yu Chang | 2018-07-31 |
| 9810990 | Chemical treatment for lithography improvement in a negative tone development process | Wei-Han Lai, Ching-Yu Chang, Cheng-Han Wu, Chin-Hsiang Lin | 2017-11-07 |