Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12374548 | Photoresist layer outgassing prevention | Yen-Yu Chen, Chih-Cheng Liu, Yi-Chen Kuo, Jr-Hung Li, Tze-Liang Lee +1 more | 2025-07-29 |
| 12272554 | Method of manufacturing a semiconductor device | Jia-Lin WEI, Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen, Yahru Cheng +4 more | 2025-04-08 |
| 12271113 | Method of manufacturing a semiconductor device | Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin WEI, Yen-Yu Chen, Jr-Hung Li +4 more | 2025-04-08 |
| 12222643 | Method of manufacturing a semiconductor device and pattern formation method | Chih-Cheng Liu, Jr-Hung Li, Yahru Cheng, Chi-Ming Yang, Tze-Liang Lee +1 more | 2025-02-11 |
| 12222654 | Lithography method for positive tone development | Chen-Yu Liu, Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2025-02-11 |
| 12222653 | Method for forming semiconductor structure | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin, Chen-Yu Liu | 2025-02-11 |
| 12159787 | Method of manufacturing a semiconductor device and pattern formation method | Chih-Cheng Liu, Jr-Hung Li, Yahru Cheng, Chi-Ming Yang, Tze-Liang Lee +1 more | 2024-12-03 |
| 12135501 | Method of manufacturing a semiconductor device | Chen-Yu Liu, Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin WEI, Yen-Yu Chen +5 more | 2024-11-05 |
| 12074025 | Photoresist developer and method of developing photoresist | An-Ren Zi, Ching-Yu Chang, Chen-Yu Liu | 2024-08-27 |
| 12057315 | Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern | Yi-Chen Kuo, Chih-Cheng Liu, Jia-Lin WEI, Yen-Yu Chen, Jr-Hung Li +4 more | 2024-08-06 |
| 12025920 | Lithography techniques for reducing defects | Ching-Yu Chang | 2024-07-02 |
| 12002675 | Photoresist layer outgassing prevention | Yen-Yu Chen, Chih-Cheng Liu, Yi-Chen Kuo, Jr-Hung Li, Tze-Liang Lee +1 more | 2024-06-04 |
| 11923326 | Bump structure and method of manufacturing bump structure | Ching-Yu Chang, Ming-Da Cheng | 2024-03-05 |
| 11822237 | Method of manufacturing a semiconductor device | Chen-Yu Liu, Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin WEI, Yen-Yu Chen +5 more | 2023-11-21 |
| 11784046 | Method of manufacturing a semiconductor device | Jia-Lin WEI, Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen, Yahru Cheng +4 more | 2023-10-10 |
| 11705332 | Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern | Yi-Chen Kuo, Chih-Cheng Liu, Jia-Lin WEI, Yen-Yu Chen, Jr-Hung Li +4 more | 2023-07-18 |
| 11694896 | Photoresist developer and method of developing photoresist | An-Ren Zi, Ching-Yu Chang, Chen-Yu Liu | 2023-07-04 |
| 11456266 | Bump structure and method of manufacturing bump structure | Ching-Yu Chang, Ming-Da Cheng | 2022-09-27 |
| 11281107 | Method for performing lithography process with post treatment | Ching-Yu Chang, Chin-Hsiang Lin | 2022-03-22 |
| 11143963 | Negative tone developer for extreme ultraviolet lithography | Chen-Yu Liu, Wei-Han Lai, Tzu-Yang Lin, Ching-Yu Chang, Chin-Hsiang Lin | 2021-10-12 |
| 11079681 | Lithography method for positive tone development | Chen-Yu Liu, Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2021-08-03 |
| 11022886 | Bottom-up material formation for planarization | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2021-06-01 |
| 11009796 | Method for forming semiconductor structure | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin, Chen-Yu Liu | 2021-05-18 |
| 10879108 | Topographic planarization method for lithography process | Tzu-Yang Lin, Cheng-Han Wu, Chin-Hsiang Lin | 2020-12-29 |
| 10866515 | Lithography process using photoresist material with photosensitive functional group | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin, Siao-Shan Wang | 2020-12-15 |