Issued Patents All Time
Showing 1–25 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12360456 | EUV metallic resist performance enhancement via additives | Joy Cheng, Ching-Yu Chang | 2025-07-15 |
| 12354874 | Method of manufacturing semiconductor devices and pattern formation method | Chun-Chih HO, Yahru Cheng, Ching-Yu Chang | 2025-07-08 |
| 12253800 | EUV metallic resist performance enhancement via additives | Joy Cheng, Ching-Yu Chang | 2025-03-18 |
| 12249507 | Method of manufacturing a semiconductor device | Ching-Yu Chang, Chin-Hsiang Lin | 2025-03-11 |
| 12222650 | Photoresist underlayer and method of manufacturing a semiconductor device | Ching-Yu Chang | 2025-02-11 |
| 12222653 | Method for forming semiconductor structure | Ming-Hui Weng, Ching-Yu Chang, Chin-Hsiang Lin, Chen-Yu Liu | 2025-02-11 |
| 12210283 | EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands | Chen-Yu Liu, Ching-Yu Chang | 2025-01-28 |
| 12210286 | Metal-compound-removing solvent and method in lithography | Joy Cheng, Ching-Yu Chang | 2025-01-28 |
| 12181798 | Extreme ultraviolet photolithography method with developer composition | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2024-12-31 |
| 12174540 | Method of manufacturing a semiconductor device | Ching-Yu Chang | 2024-12-24 |
| 12106961 | Humidity control or aqueous treatment for EUV metallic resist | Yahru Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2024-10-01 |
| 12074025 | Photoresist developer and method of developing photoresist | Ming-Hui Weng, Ching-Yu Chang, Chen-Yu Liu | 2024-08-27 |
| 12050404 | Photoresist with polar-acid-labile-group | Ching-Yu Chang | 2024-07-30 |
| 12019375 | Photosensitive material and method of lithography | Ching-Yu Chang, Chien-Wei Wang | 2024-06-25 |
| 12009210 | Method of manufacturing a semiconductor device | Ching-Yu Chang, Chin-Hsiang Lin | 2024-06-11 |
| 11971657 | Photoresist developer and method of developing photoresist | Chin-Hsiang Lin, Ching-Yu Chang, Yahru Cheng | 2024-04-30 |
| 11942322 | Method of manufacturing semiconductor devices and pattern formation method | Chun-Chih HO, Yahru Cheng, Ching-Yu Chang | 2024-03-26 |
| 11934101 | Photoresist composition and method of forming photoresist pattern | Ching-Yu Chang | 2024-03-19 |
| 11822238 | Extreme ultraviolet photolithography method with developer composition | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2023-11-21 |
| 11822251 | Photoresist with polar-acid-labile-group | Ching-Yu Chang | 2023-11-21 |
| 11796918 | Underlayer material for photoresist | Wei-Han Lai, Ching-Yu Chang | 2023-10-24 |
| 11762296 | Method and apparatus of patterning a semiconductor device | Ching-Yu Chang | 2023-09-19 |
| 11694896 | Photoresist developer and method of developing photoresist | Ming-Hui Weng, Ching-Yu Chang, Chen-Yu Liu | 2023-07-04 |
| 11681221 | EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands | Chen-Yu Liu, Ching-Yu Chang | 2023-06-20 |
| 11681226 | Metal-compound-removing solvent and method in lithography | Joy Cheng, Ching-Yu Chang | 2023-06-20 |