Issued Patents All Time
Showing 26–50 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11626285 | Method of manufacturing a semiconductor device | Ching-Yu Chang, Chin-Hsiang Lin | 2023-04-11 |
| 11605538 | Protective composition and method of forming photoresist pattern | Ching-Yu Chang, Chin-Hsiang Lin | 2023-03-14 |
| 11495460 | Method for forming semiconductor structure by patterning resist layer having inorganic material | Chin-Hsiang Lin, Ching-Yu Chang | 2022-11-08 |
| 11460776 | Method and apparatus of patterning a semiconductor device | Ching-Yu Chang | 2022-10-04 |
| 11456170 | Cleaning solution and method of cleaning wafer | Ching-Yu Chang | 2022-09-27 |
| 11307504 | Humidity control in EUV lithography | Chin-Hsiang Lin, Ching-Yu Chang, Joy Cheng | 2022-04-19 |
| 11300878 | Photoresist developer and method of developing photoresist | Chin-Hsiang Lin, Ching-Yu Chang, Joy Cheng | 2022-04-12 |
| 11287740 | Photoresist composition and method of forming photoresist pattern | Chin-Hsiang Lin, Ching-Yu Chang | 2022-03-29 |
| 11269256 | Underlayer material for photoresist | Wei-Han Lai, Ching-Yu Chang | 2022-03-08 |
| 11262659 | Method of cleaning extreme ultraviolet lithography collector | Chin-Hsiang Lin, Ching-Yu Chang | 2022-03-01 |
| 11215924 | Photoresist, developer, and method of forming photoresist pattern | Ching-Yu Chang, Chin-Hsiang Lin | 2022-01-04 |
| 11137685 | Semiconductor method of protecting wafer from bevel contamination | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2021-10-05 |
| 11054742 | EUV metallic resist performance enhancement via additives | Joy Cheng, Ching-Yu Chang | 2021-07-06 |
| 11036137 | Method for forming semiconductor structure | Ching-Yu Chang, Chin-Hsiang Lin | 2021-06-15 |
| 11029602 | Photoresist composition and method of forming photoresist pattern | Chin-Hsiang Lin, Ching-Yu Chang, Yahru Cheng | 2021-06-08 |
| 11016386 | Photoresist composition and method of forming photoresist pattern | Chin-Hsiang Lin, Ching-Yu Chang | 2021-05-25 |
| 11009796 | Method for forming semiconductor structure | Ming-Hui Weng, Ching-Yu Chang, Chin-Hsiang Lin, Chen-Yu Liu | 2021-05-18 |
| 10990013 | Method for forming semiconductor structure | Ching-Yu Chang, Chin-Hsiang Lin | 2021-04-27 |
| 10866511 | Extreme ultraviolet photolithography method with developer composition | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-15 |
| 10866516 | Metal-compound-removing solvent and method in lithography | Joy Cheng, Ching-Yu Chang | 2020-12-15 |
| 10838304 | Priming material for organometallic resist | Chun-Chih HO, Ching-Yu Chang | 2020-11-17 |
| 10777681 | Multi-layer photoresist | Ching-Yu Chang, Chin-Hsiang Lin | 2020-09-15 |
| 10741410 | Material composition and methods thereof | Joy Cheng, Ching-Yu Chang | 2020-08-11 |
| 10741391 | Method for forming semiconductor structure by patterning resist layer having inorganic material | Chin-Hsiang Lin, Ching-Yu Chang | 2020-08-11 |
| 10698317 | Underlayer material for photoresist | Wei-Han Lai, Ching-Yu Chang | 2020-06-30 |