Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12354874 | Method of manufacturing semiconductor devices and pattern formation method | An-Ren Zi, Yahru Cheng, Ching-Yu Chang | 2025-07-08 |
| 12222647 | Photoresist composition and method of forming photoresist pattern | Ching-Yu Chang, Chin-Hsiang Lin | 2025-02-11 |
| 12087616 | Air gap formation method | Yu-Chung Su, Ching-Yu Chang, Chin-Hsiang Lin | 2024-09-10 |
| 11971659 | Photoresist composition and method of forming photoresist pattern | Ching-Yu Chang, Chin-Hsiang Lin | 2024-04-30 |
| 11942322 | Method of manufacturing semiconductor devices and pattern formation method | An-Ren Zi, Yahru Cheng, Ching-Yu Chang | 2024-03-26 |
| 11886121 | Method for forming patterned photoresist | Ching-Yu Chang, Chin-Hsiang Lin | 2024-01-30 |
| 11022885 | Photosensitive middle layer | Kuan-Hsin Lo, Ching-Yu Chang, Chin-Hsiang Lin | 2021-06-01 |
| 10838304 | Priming material for organometallic resist | An-Ren Zi, Ching-Yu Chang | 2020-11-17 |
| 9650495 | Manufacturing method for enhancing ordered structure of block copolymers | Wei-Fang Su, Shang-Jung WU | 2017-05-16 |
| 7704415 | Composite material with electron-donating and electron-accepting property, method for forming the same, and their application | Wei-Fang Su, Chi-An Dai | 2010-04-27 |