Issued Patents All Time
Showing 51–59 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10684545 | Method for forming semiconductor structure by patterning assist layer having polymer | Ching-Yu Chang, Chin-Hsiang Lin | 2020-06-16 |
| 10635000 | Semiconductor method of protecting wafer from bevel contamination | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2020-04-28 |
| 10622211 | Metal-compound-removing solvent and method in lithography | Joy Cheng, Ching-Yu Chang | 2020-04-14 |
| 10503070 | Photosensitive material and method of lithography | Ching-Yu Chang, Chien-Wei Wang | 2019-12-10 |
| 10466593 | Method and apparatus of patterning a semiconductor device | Ching-Yu Chang | 2019-11-05 |
| 10381481 | Multi-layer photoresist | Ching-Yu Chang, Chin-Hsiang Lin | 2019-08-13 |
| 10274847 | Humidity control in EUV lithography | Chin-Hsiang Lin, Ching-Yu Chang, Joy Cheng | 2019-04-30 |
| 10073347 | Semiconductor method of protecting wafer from bevel contamination | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2018-09-11 |
| 9529265 | Method of preparing and using photosensitive material | Chen-Hau Wu, Ching-Yu Chang | 2016-12-27 |