Issued Patents All Time
Showing 25 most recent of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12360456 | EUV metallic resist performance enhancement via additives | An-Ren Zi, Ching-Yu Chang | 2025-07-15 |
| 12253800 | EUV metallic resist performance enhancement via additives | An-Ren Zi, Ching-Yu Chang | 2025-03-18 |
| 12210286 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Ching-Yu Chang | 2025-01-28 |
| 12181798 | Extreme ultraviolet photolithography method with developer composition | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin | 2024-12-31 |
| 12012504 | Process for the preparation of multimodal high density polyethylene | Anh Tuan Tran, Alexandra Romina Albunia, Joseph Thorman, John Jamieson, Ravindra Tupe | 2024-06-18 |
| 11822238 | Extreme ultraviolet photolithography method with developer composition | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin | 2023-11-21 |
| 11681226 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Ching-Yu Chang | 2023-06-20 |
| 11427670 | Composition and process | Peter Roos, Mark Jeruzal, Qizheng Duo, Erik Eriksson | 2022-08-30 |
| 11307504 | Humidity control in EUV lithography | An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang | 2022-04-19 |
| 11300878 | Photoresist developer and method of developing photoresist | An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang | 2022-04-12 |
| 11137685 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin | 2021-10-05 |
| 11054742 | EUV metallic resist performance enhancement via additives | An-Ren Zi, Ching-Yu Chang | 2021-07-06 |
| 10872773 | Methods of reducing pattern roughness in semiconductor fabrication | Chien-Wei Wang, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-22 |
| 10866516 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Ching-Yu Chang | 2020-12-15 |
| 10866511 | Extreme ultraviolet photolithography method with developer composition | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-15 |
| 10796910 | Method for performing a photolithography process | Tsung-Han Ko, Ching-Yu Chang, Chin-Hsiang Lin | 2020-10-06 |
| 10741410 | Material composition and methods thereof | An-Ren Zi, Ching-Yu Chang | 2020-08-11 |
| 10635000 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin | 2020-04-28 |
| 10622211 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Ching-Yu Chang | 2020-04-14 |
| 10573519 | Method for performing a photolithography process | Tsung-Han Ko, Ching-Yu Chang, Chin-Hsiang Lin | 2020-02-25 |
| 10515812 | Methods of reducing pattern roughness in semiconductor fabrication | Chien-Wei Wang, Ching-Yu Chang, Chin-Hsiang Lin | 2019-12-24 |
| 10418245 | Method for integrated circuit manufacturing with directed self-assembly (DSA) | Chih-Jie Lee | 2019-09-17 |
| 10274847 | Humidity control in EUV lithography | An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang | 2019-04-30 |
| 10259907 | Block copolymers with surface-active junction groups, compositions and processes thereof | Ankit Vora, Eri Hirahara, Durairaj BASKARAN, Orest Polishchuk, Melia Tjio +3 more | 2019-04-16 |
| 10081740 | Directed self-assembly | Michael A. Guillorn, Chi-Chun Liu, Jed W. Pitera, HsinYu Tsai | 2018-09-25 |