| 12360456 |
EUV metallic resist performance enhancement via additives |
An-Ren Zi, Ching-Yu Chang |
2025-07-15 |
|
| 12253800 |
EUV metallic resist performance enhancement via additives |
An-Ren Zi, Ching-Yu Chang |
2025-03-18 |
|
| 12210286 |
Metal-compound-removing solvent and method in lithography |
An-Ren Zi, Ching-Yu Chang |
2025-01-28 |
|
| 12181798 |
Extreme ultraviolet photolithography method with developer composition |
An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin |
2024-12-31 |
$20,928,000 |
| 12012504 |
Process for the preparation of multimodal high density polyethylene |
Anh Tuan Tran, Alexandra Romina Albunia, Joseph Thorman, John Jamieson, Ravindra Tupe |
2024-06-18 |
|
| 11822238 |
Extreme ultraviolet photolithography method with developer composition |
An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin |
2023-11-21 |
$8,803,000 |
| 11681226 |
Metal-compound-removing solvent and method in lithography |
An-Ren Zi, Ching-Yu Chang |
2023-06-20 |
$9,516,000 |
| 11427670 |
Composition and process |
Peter Roos, Mark Jeruzal, Qizheng Duo, Erik Eriksson |
2022-08-30 |
|
| 11307504 |
Humidity control in EUV lithography |
An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang |
2022-04-19 |
$10,829,000 |
| 11300878 |
Photoresist developer and method of developing photoresist |
An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang |
2022-04-12 |
$11,948,000 |
| 11137685 |
Semiconductor method of protecting wafer from bevel contamination |
An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin |
2021-10-05 |
$16,835,000 |
| 11054742 |
EUV metallic resist performance enhancement via additives |
An-Ren Zi, Ching-Yu Chang |
2021-07-06 |
$21,457,000 |
| 10872773 |
Methods of reducing pattern roughness in semiconductor fabrication |
Chien-Wei Wang, Ching-Yu Chang, Chin-Hsiang Lin |
2020-12-22 |
$12,056,000 |
| 10866516 |
Metal-compound-removing solvent and method in lithography |
An-Ren Zi, Ching-Yu Chang |
2020-12-15 |
$3,031,000 |
| 10866511 |
Extreme ultraviolet photolithography method with developer composition |
An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin |
2020-12-15 |
$3,031,000 |
| 10796910 |
Method for performing a photolithography process |
Tsung-Han Ko, Ching-Yu Chang, Chin-Hsiang Lin |
2020-10-06 |
$12,045,000 |
| 10741410 |
Material composition and methods thereof |
An-Ren Zi, Ching-Yu Chang |
2020-08-11 |
$11,139,000 |
| 10635000 |
Semiconductor method of protecting wafer from bevel contamination |
An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin |
2020-04-28 |
$7,447,000 |
| 10622211 |
Metal-compound-removing solvent and method in lithography |
An-Ren Zi, Ching-Yu Chang |
2020-04-14 |
$9,665,000 |
| 10573519 |
Method for performing a photolithography process |
Tsung-Han Ko, Ching-Yu Chang, Chin-Hsiang Lin |
2020-02-25 |
$48,850,000 |
| 10515812 |
Methods of reducing pattern roughness in semiconductor fabrication |
Chien-Wei Wang, Ching-Yu Chang, Chin-Hsiang Lin |
2019-12-24 |
$1,969,000 |
| 10418245 |
Method for integrated circuit manufacturing with directed self-assembly (DSA) |
Chih-Jie Lee |
2019-09-17 |
$15,951,000 |
| 10274847 |
Humidity control in EUV lithography |
An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang |
2019-04-30 |
$1,428,000 |
| 10259907 |
Block copolymers with surface-active junction groups, compositions and processes thereof |
Ankit Vora, Eri Hirahara, Durairaj BASKARAN, Orest Polishchuk, Melia Tjio +3 more |
2019-04-16 |
|
| 10081740 |
Directed self-assembly |
Michael A. Guillorn, Chi-Chun Liu, Jed W. Pitera, HsinYu Tsai |
2018-09-25 |
$2,527,000 |
